Invention Grant
- Patent Title: Method of forming magnetic patterns, and method of manufacturing magnetic memory devices
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Application No.: US15259198Application Date: 2016-09-08
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Publication No.: US10062837B2Publication Date: 2018-08-28
- Inventor: Ho-Young Kim , Jin-Hye Bae , Hoon Han , Won-Jun Lee , Chang-Kyu Lee , Geun-Joo Baek , Jung-Ig Jeon
- Applicant: SAMSUNG ELECTRONICS CO., LTD.
- Applicant Address: KR Suwon-si, Gyeonggi-do KR Cheonan-si, Chungcheongnam-do
- Assignee: SAMSUNG ELECTRONICS CO., LTD.,SAMYOUNG PURE CHEMICALS CO., LTD.
- Current Assignee: SAMSUNG ELECTRONICS CO., LTD.,SAMYOUNG PURE CHEMICALS CO., LTD.
- Current Assignee Address: KR Suwon-si, Gyeonggi-do KR Cheonan-si, Chungcheongnam-do
- Agency: Lee & Morse, P.C.
- Priority: KR10-2015-0165120 20151125
- Main IPC: C11D11/00
- IPC: C11D11/00 ; H01L43/08 ; H01L43/12 ; H01L43/02 ; G11C11/16 ; H01L43/10 ; H01L27/22
Abstract:
A composition for cleaning a magnetic pattern, a method of manufacturing a magnetic memory device, a method of forming a magnetic pattern, and a magnetic memory device, the composition including a glycol ether-based organic solvent; a decomposing agent that includes an aliphatic amine; and at least one of a chelating agent, or a cleaning accelerator that includes an organic alkaline compound, wherein the composition is devoid of water.
Public/Granted literature
- US20170148979A1 METHOD OF FORMING MAGNETIC PATTERNS, AND METHOD OF MANUFACTURING MAGNETIC MEMORY DEVICES Public/Granted day:2017-05-25
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