公开(公告)号：US09318697B2

公开(公告)日：2016-04-19

申请号：US14449408

申请日：2014-08-01

Applicant: SAMSUNG ELECTRONICS CO., LTD.

Inventor： Jin-Hye Bae ,  Won-Jun Lee ,  Sung-Yoon Chung ,  Taek-Dong Chung

IPC: H01L43/12 ,  H01L43/10 ,  H01L27/22

CPC classification number: H01L43/12 ,  G11C11/161 ,  H01L27/228 ,  H01L43/10

Abstract: In a method of detecting an etch by-product, the method including forming a magnetic layer including palladium (Pd) on a substrate; etching the magnetic layer to form a magnetic layer pattern; depositing a mixture including an alkyl bromide compound on a surface of the magnetic layer pattern; and measuring a current difference between the substrate and the mixture to detect an etch by-product on the surface of the magnetic layer pattern.

Abstract translation: 在检测蚀刻副产物的方法中，所述方法包括在基底上形成包括钯（Pd）的磁性层; 蚀刻磁性层以形成磁性层图案; 在所述磁性层图案的表面上沉积包含烷基溴化合物的混合物; 并测量衬底和混合物之间的电流差以检测磁性层图案表面上的蚀刻副产物。

公开(公告)号：US20180358544A1

公开(公告)日：2018-12-13

申请号：US16108316

申请日：2018-08-22

Applicant: SAMSUNG ELECTRONICS CO., LTD.

Inventor： Ho-Young Kim ,  Jin-Hye Bae ,  Hoon Han ,  Won-Jun Lee ,  Chang-Kyu Lee ,  Geun-Joo Baek ,  Jung-Ig Jeon

IPC: H01L43/08 ,  H01L43/12 ,  H01L43/10 ,  H01L43/02 ,  H01L27/22 ,  G11C11/16

CPC classification number: H01L43/08 ,  G11C11/161 ,  H01L27/228 ,  H01L43/02 ,  H01L43/10 ,  H01L43/12

Abstract: A composition for cleaning a magnetic pattern, a method of manufacturing a magnetic memory device, a method of forming a magnetic pattern, and a magnetic memory device, the composition including a glycol ether-based organic solvent; a decomposing agent that includes an aliphatic amine; and at least one of a chelating agent, or a cleaning accelerator that includes an organic alkaline compound, wherein the composition is devoid of water.

公开(公告)号：US10833251B2

公开(公告)日：2020-11-10

申请号：US16108316

申请日：2018-08-22

Applicant: SAMSUNG ELECTRONICS CO., LTD.

Inventor： Ho-Young Kim ,  Jin-Hye Bae ,  Hoon Han ,  Won-Jun Lee ,  Chang-Kyu Lee ,  Geun-Joo Baek ,  Jung-Ig Jeon

IPC: C11D7/50 ,  H01L43/08 ,  G11C11/16 ,  H01L27/22 ,  H01L43/02 ,  H01L43/10 ,  H01L43/12

Abstract: A composition for cleaning a magnetic pattern, a method of manufacturing a magnetic memory device, a method of forming a magnetic pattern, and a magnetic memory device, the composition including a glycol ether-based organic solvent; a decomposing agent that includes an aliphatic amine; and at least one of a chelating agent, or a cleaning accelerator that includes an organic alkaline compound, wherein the composition is devoid of water.

公开(公告)号：US10062837B2

公开(公告)日：2018-08-28

申请号：US15259198

申请日：2016-09-08

Applicant: SAMSUNG ELECTRONICS CO., LTD.

Inventor： Ho-Young Kim ,  Jin-Hye Bae ,  Hoon Han ,  Won-Jun Lee ,  Chang-Kyu Lee ,  Geun-Joo Baek ,  Jung-Ig Jeon

IPC: C11D11/00 ,  H01L43/08 ,  H01L43/12 ,  H01L43/02 ,  G11C11/16 ,  H01L43/10 ,  H01L27/22

CPC classification number: H01L43/08 ,  G11C11/161 ,  H01L27/228 ,  H01L43/02 ,  H01L43/10 ,  H01L43/12

Abstract: A composition for cleaning a magnetic pattern, a method of manufacturing a magnetic memory device, a method of forming a magnetic pattern, and a magnetic memory device, the composition including a glycol ether-based organic solvent; a decomposing agent that includes an aliphatic amine; and at least one of a chelating agent, or a cleaning accelerator that includes an organic alkaline compound, wherein the composition is devoid of water.