Invention Grant
- Patent Title: Layout pattern of a memory device formed by static random access memory
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Application No.: US15795270Application Date: 2017-10-27
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Publication No.: US10068909B1Publication Date: 2018-09-04
- Inventor: Chun-Yen Tseng , Ching-Cheng Lung , Yu-Tse Kuo , Chun-Hsien Huang , Chien-Hung Chen
- Applicant: UNITED MICROELECTRONICS CORP.
- Applicant Address: TW Hsin-Chu
- Assignee: UNITED MICROELECTRONICS CORP.
- Current Assignee: UNITED MICROELECTRONICS CORP.
- Current Assignee Address: TW Hsin-Chu
- Agent Winston Hsu
- Priority: CN201710864858 20170922
- Main IPC: G11C11/412
- IPC: G11C11/412 ; G11C11/40 ; H01L27/11 ; H01L27/02 ; H01L23/528 ; G11C11/419 ; H01L29/423 ; H01L29/08 ; H01L27/088

Abstract:
The present invention provides a layout pattern of a memory device composed of static random access memory (SRAM), comprising four memory units located on a substrate, each memory unit being located in a non-rectangular region, the four non-rectangular regions combine a rectangular region, wherein each memory unit comprises a first inverter comprising a first pull-up transistor (PL1) and a first pull-down transistor (PD1), a second inverter comprises a second pull-up transistor (PL2) and a second pull-down transistor (PD2), an access transistor (PG) and a switching transistor (SW), wherein the source of the PG is coupled to an input terminal of the first inverter and a drain of the SW, a source of the SW is coupled to an output of the second inverter, wherein the PD1, the PD2, the SW, and the PG comprise a first diffusion region, the PL1 and the PL2 comprise a second diffusion region.
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