Invention Grant
- Patent Title: Superlattice buffer structure for gallium nitride transistors
-
Application No.: US14620399Application Date: 2015-02-12
-
Publication No.: US10109736B2Publication Date: 2018-10-23
- Inventor: Chi-Ming Chen , Chung-Yi Yu , Po-Chun Liu
- Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.
- Applicant Address: TW Hsin-Chu
- Assignee: Taiwan Semiconductor Manufacturing Co., Ltd.
- Current Assignee: Taiwan Semiconductor Manufacturing Co., Ltd.
- Current Assignee Address: TW Hsin-Chu
- Agency: Eschweiler & Potashnik, LLC
- Main IPC: H01L29/06
- IPC: H01L29/06 ; H01L29/78 ; H01L29/15 ; H01L29/205 ; H01L21/02 ; H01L29/66

Abstract:
A transistor with a multi-strained layer superlattice (SLS) structure is provided. A first strained layer superlattice (SLS) layer is arranged over a substrate. A first buffer layer is arranged over the first SLS layer and includes dopants configured to increase a resistance of the first buffer layer. A second SLS layer is arranged over the first buffer layer. A second buffer layer is arranged over the second SLS layer and includes dopants configured to increase a resistance of the second buffer layer. A channel layer is arranged over the second buffer layer. An active layer is arranged over and directly abuts the channel layer. The channel and active layers collectively define a heterojunction. A method for manufacturing the transistor is also provided.
Public/Granted literature
- US20160240679A1 SUPPERLATTICE BUFFER STRUCTURE FOR GALLIUM NITRIDE TRANSISTORS Public/Granted day:2016-08-18
Information query
IPC分类: