- Patent Title: Underpotential deposition of metal monolayers from ionic liquids
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Application No.: US14996872Application Date: 2016-01-15
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Publication No.: US10195822B2Publication Date: 2019-02-05
- Inventor: Weilong Zhang , Xiaomei Yu , Lei Chen , Mark R. Jaworowski , Joseph J. Sangiovanni
- Applicant: United Technologies Corporation
- Applicant Address: US CT Farmington
- Assignee: United Technologies Corporation
- Current Assignee: United Technologies Corporation
- Current Assignee Address: US CT Farmington
- Agency: Kinney & Lange, P.A.
- Main IPC: B32B15/01
- IPC: B32B15/01 ; C25D5/44 ; C23C28/02 ; C25D3/66 ; C25D3/44 ; C25D5/10 ; C25D5/18 ; C25D5/40 ; C25D5/00

Abstract:
A metal article comprises an alloy substrate having a surface and a non-diffused metal monolayer disposed thereon. The surface has a first surface work function value Φs. The non-diffused monolayer deposited on the surface has a second surface work function value Φs that is less negative than the first surface work function value. A method for depositing the monolayer via underpotential deposition (UPD) is also disclosed.
Public/Granted literature
- US20160129672A1 UNDERPOTENTIAL DEPOSITION OF METAL MONOLAYERS FROM IONIC LIQUIDS Public/Granted day:2016-05-12
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