- 专利标题： Underpotential deposition of metal monolayers from ionic liquids
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申请号： US14996872申请日： 2016-01-15
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公开(公告)号： US10195822B2公开(公告)日： 2019-02-05
- 发明人: Weilong Zhang , Xiaomei Yu , Lei Chen , Mark R. Jaworowski , Joseph J. Sangiovanni
- 申请人： United Technologies Corporation
- 申请人地址： US CT Farmington
- 专利权人： United Technologies Corporation
- 当前专利权人： United Technologies Corporation
- 当前专利权人地址： US CT Farmington
- 代理机构： Kinney & Lange, P.A.
- 主分类号： B32B15/01
- IPC分类号： B32B15/01 ; C25D5/44 ; C23C28/02 ; C25D3/66 ; C25D3/44 ; C25D5/10 ; C25D5/18 ; C25D5/40 ; C25D5/00
摘要：
A metal article comprises an alloy substrate having a surface and a non-diffused metal monolayer disposed thereon. The surface has a first surface work function value Φs. The non-diffused monolayer deposited on the surface has a second surface work function value Φs that is less negative than the first surface work function value. A method for depositing the monolayer via underpotential deposition (UPD) is also disclosed.
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