Invention Grant
- Patent Title: Determination of gain for eddy current sensor
-
Application No.: US15046270Application Date: 2016-02-17
-
Publication No.: US10207386B2Publication Date: 2019-02-19
- Inventor: Kun Xu , Shih-Haur Shen , Boguslaw A. Swedek , Ingemar Carlsson , Doyle E. Bennett , Wen-Chiang Tu , Hassan G. Iravani , Tzu-Yu Liu
- Applicant: Applied Materials, Inc.
- Applicant Address: US CA Santa Clara
- Assignee: Applied Materials, Inc.
- Current Assignee: Applied Materials, Inc.
- Current Assignee Address: US CA Santa Clara
- Agency: Fish & Richardson P.C.
- Main IPC: B24B37/013
- IPC: B24B37/013 ; B24B49/10 ; H01L21/67 ; H01L21/66 ; H01L21/321

Abstract:
A method of controlling polishing includes polishing a substrate at a first polishing station, monitoring the substrate with a first eddy current monitoring system to generate a first signal, determining an ending value of the first signal for an end of polishing of the substrate at the first polishing station, determining a first temperature at the first polishing station, polishing the substrate at a second polishing station, monitoring the substrate with a second eddy current monitoring system to generate a second signal, determining a starting value of the second signal for a start of polishing of the substrate at the second polishing station, determining a gain for the second polishing station based on the ending value, the starting value and the first temperature, and calculating a third signal based on the second signal and the gain.
Public/Granted literature
- US20160158908A1 DETERMINATION OF GAIN FOR EDDY CURRENT SENSOR Public/Granted day:2016-06-09
Information query