Invention Grant
- Patent Title: Varying thickness inductor
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Application No.: US15242007Application Date: 2016-08-19
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Publication No.: US10354795B2Publication Date: 2019-07-16
- Inventor: Daeik Daniel Kim , Chengjie Zuo , Changhan Hobie Yun , Mario Francisco Velez , Robert Paul Mikulka , Xiangdong Zhang , Jonghae Kim , Je-Hsiung Lan
- Applicant: QUALCOMM Incorporated
- Applicant Address: US CA San Diego
- Assignee: QUALCOMM Incorporated
- Current Assignee: QUALCOMM Incorporated
- Current Assignee Address: US CA San Diego
- Agency: Qualcomm Incorporated-Toler
- Main IPC: H01F7/06
- IPC: H01F7/06 ; H01F41/04 ; H01F27/28 ; H01F17/00

Abstract:
A method includes forming a first conductive spiral and a second conductive spiral of a spiral inductor coupled to a substrate. The second conductive spiral overlays the first conductive spiral. A first portion of an innermost turn of the spiral inductor has a first thickness in a direction perpendicular to the substrate. The first portion of the innermost turn includes a first portion of the first conductive spiral and does not include the second conductive spiral. A second portion of the innermost turn includes a first portion of the second conductive spiral. A portion of an outermost turn of the spiral inductor has a second thickness in the direction perpendicular to the substrate. The second thickness is greater than the first thickness. The portion of the outermost turn includes a second portion of the first conductive spiral and a second portion of the second conductive spiral.
Public/Granted literature
- US20160358709A1 VARYING THICKNESS INDUCTOR Public/Granted day:2016-12-08
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