Invention Grant
- Patent Title: Method for producing a nitride compound semiconductor device
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Application No.: US15573468Application Date: 2016-05-11
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Publication No.: US10354865B2Publication Date: 2019-07-16
- Inventor: Joachim Hertkorn , Lorenzo Zini , Alexander Frey
- Applicant: OSRAM Opto Semiconductors GmbH
- Applicant Address: DE Regensburg
- Assignee: OSRAM Opto Semiconductors GmbH
- Current Assignee: OSRAM Opto Semiconductors GmbH
- Current Assignee Address: DE Regensburg
- Agency: Slater Matsil, LLP
- Priority: DE102015107661 20150515
- International Application: PCT/EP2016/060575 WO 20160511
- International Announcement: WO2016/184752 WO 20161124
- Main IPC: H04L21/02
- IPC: H04L21/02 ; C30B25/04 ; H01L21/02 ; C30B29/40 ; C30B25/18 ; C30B33/10

Abstract:
A method for procuring a nitride compound semiconductor device is disclosed. In an embodiment the method includes growing a first nitride compound semiconductor layer onto a growth substrate, depositing a masking layer, growing a second nitride compound semiconductor layer onto the masking layer, growing a third nitride compound semiconductor layer onto the second nitride compound semiconductor layer such that the third nitride compound semiconductor layer has non-planar structures and growing a fourth nitride compound semiconductor layer onto the non-planar structures such that the fourth nitride compound semiconductor layer has an essentially planar surface. The method further includes growing a functional layer sequence of the nitride compound semiconductor device, connecting a side of the functional layer sequence located opposite to the growth substrate to a carrier and removing the growth substrate.
Public/Granted literature
- US20180144933A1 Method for Producing a Nitride Compound Semiconductor Device Public/Granted day:2018-05-24
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