- 专利标题: High-purity dispense system
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申请号: US15675383申请日: 2017-08-11
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公开(公告)号: US10403501B2公开(公告)日: 2019-09-03
- 发明人: Anton J. deVilliers , Rodney L. Robison , Ronald Nasman , David Travis , James Grootegoed , Norman A. Jacobson, Jr. , Lior Huli , Joshua S. Hooge
- 申请人: Tokyo Electron Limited
- 申请人地址: JP Tokyo
- 专利权人: Tokyo Electron Limited
- 当前专利权人: Tokyo Electron Limited
- 当前专利权人地址: JP Tokyo
- 代理机构: Oblon, McClelland, Maier & Neustadt, L.L.P.
- 主分类号: B05C11/10
- IPC分类号: B05C11/10 ; H01L21/02 ; H01L21/027 ; B05B15/55 ; H01L21/67 ; B05C5/02
摘要:
Techniques herein include a bladder-based dispense system using an elongate bladder configured to selectively expand and contract to assist with dispense actions. This dispense system compensates for filter-lag, which often accompanies fluid filtering for microfabrication. This dispense system also provides a high-purity and high precision dispense unit. A process fluid filter is located downstream from a process fluid source as well as a system valve. Downstream from the process fluid filter there are no valves. Dispense actions can be initiated and stop while the system valve is open by using the elongate bladder. The elongate bladder can be expanded to stop or pause a dispense action, and then be contracted to assist with a dispense action.
公开/授权文献
- US20180047562A1 High-Purity Dispense System 公开/授权日:2018-02-15
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