Invention Grant
- Patent Title: Separation of workpiece with three material removal stages
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Application No.: US15863954Application Date: 2018-01-07
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Publication No.: US10403506B2Publication Date: 2019-09-03
- Inventor: Christoph Kamseder , Franco Mariani , Andreas Bauer , Thomas Fischer
- Applicant: Infineon Technologies AG
- Applicant Address: DE Neubiberg
- Assignee: Infineon Technologies AG
- Current Assignee: Infineon Technologies AG
- Current Assignee Address: DE Neubiberg
- Main IPC: H01L21/304
- IPC: H01L21/304 ; H01L21/78 ; H01L21/67 ; H01L21/66

Abstract:
A method of manufacturing electronic dies by separating a wafer into electronic dies, wherein the method comprises forming a groove in the wafer with a first material removal tool having a first thickness, enlarging the groove by a second material removal tool having a second thickness larger than the first thickness, and subsequently increasing a depth of the groove by a third material removal tool having a third thickness smaller than the second thickness until the wafer is separated.
Public/Granted literature
- US20190214299A1 Separation of workpiece with three material removal stages Public/Granted day:2019-07-11
Information query
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