Invention Grant
- Patent Title: Glass-based substrate with vias and process of forming the same
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Application No.: US16131247Application Date: 2018-09-14
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Publication No.: US10438039B2Publication Date: 2019-10-08
- Inventor: Yuhui Jin , Matthew Evan Wilhelm
- Applicant: CORNING INCORPORATED
- Applicant Address: US NY Corning
- Assignee: Corning Incorporated
- Current Assignee: Corning Incorporated
- Current Assignee Address: US NY Corning
- Agent John P. McGroarty
- Main IPC: C03C15/00
- IPC: C03C15/00 ; G06K9/00 ; C03B33/02 ; B23K26/53 ; B23K26/00 ; C03C23/00 ; H05K1/03 ; H05K1/11 ; H05K3/00 ; H05K3/22 ; H05K3/40 ; H05K5/00 ; C03C17/36 ; C03C21/00 ; B23K26/382 ; B23K26/386 ; B23K26/402 ; B23K101/42 ; B23K103/00

Abstract:
A glass sensor substrate including metallizable through vias and related process is provided. The glass substrate has a first major surface, a second major surface and an average thickness of greater than 0.3 mm. A plurality of etch paths are created through the glass substrate by directing a laser at the substrate in a predetermined pattern. A plurality of through vias through the glass substrate are etched along the etch paths using a hydroxide based etching material. The hydroxide based etching material highly preferentially etches the substrate along the etch path. Each of the plurality of through vias is long compared to their diameter for example such that a ratio of the thickness of the glass substrate to a maximum diameter of each of the through vias is greater than 8 to 1.
Public/Granted literature
- US20190012514A1 GLASS-BASED SUBSTRATE WITH VIAS AND PROCESS OF FORMING THE SAME Public/Granted day:2019-01-10
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