Invention Grant
- Patent Title: Vertical memory cells and memory devices using the same
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Application No.: US15965872Application Date: 2018-04-28
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Publication No.: US10446206B2Publication Date: 2019-10-15
- Inventor: Chun-Chieh Mo , Shih-Chi Kuo
- Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.
- Applicant Address: TW Hsin-Chu
- Assignee: Taiwan Semiconductor Manufacturing Co., Ltd.
- Current Assignee: Taiwan Semiconductor Manufacturing Co., Ltd.
- Current Assignee Address: TW Hsin-Chu
- Agency: Duane Morris LLP
- Main IPC: G11C11/16
- IPC: G11C11/16 ; H01L27/22 ; H01L43/08 ; H01L43/12 ; H01L43/10 ; H01L43/02 ; G11C8/14 ; G11C7/18

Abstract:
Vertical memory cells and memory devices using the same are disclosed. In one example, a memory cell formed on a backend layer over a substrate is disclosed. The memory cell includes: a first electrode, a second electrode and a magnetic tunnel junction. The first electrode has sidewalls and a bottom surface disposed over the backend layer. The second electrode has sidewalls and a bottom surface in contact with the backend layer. The magnetic tunnel junction is formed between the first electrode and the second electrode. The magnetic tunnel junction is coupled to a sidewall of the first electrode and coupled to a sidewall of the second electrode.
Public/Granted literature
- US20190164585A1 VERTICAL MEMORY CELLS AND MEMORY DEVICES USING THE SAME Public/Granted day:2019-05-30
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