Invention Grant
- Patent Title: Aberration correction method, aberration correction system, and charged particle beam apparatus
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Application No.: US15741038Application Date: 2015-07-01
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Publication No.: US10446361B2Publication Date: 2019-10-15
- Inventor: Zhaohui Cheng , Tomonori Nakano , Kotoko Urano , Takeyoshi Ohashi , Yasunari Sohda , Hideyuki Kazumi
- Applicant: HITACHI HIGH-TECHNOLOGIES CORPORATION
- Applicant Address: JP Tokyo
- Assignee: HITACHI HIGH-TECHNOLOGIES CORPORATION
- Current Assignee: HITACHI HIGH-TECHNOLOGIES CORPORATION
- Current Assignee Address: JP Tokyo
- Agency: Miles & Stockbridge P.C.
- International Application: PCT/JP2015/069048 WO 20150701
- International Announcement: WO2017/002243 WO 20170105
- Main IPC: H01J37/153
- IPC: H01J37/153 ; H01J37/141 ; H01J37/147 ; H01J37/22 ; H01J37/244 ; H01J37/28

Abstract:
In order to provide an aberration correction system that realizes a charged particle beam of which the anisotropy is reduced or eliminated on a sample surface even in the case where there is magnetic interference between pole stages of an aberration corrector, an correction system includes a line cross position control device (209) which controls a line cross position in the aberration corrector of the charged particle beam so that a designed value and an actually measured value of the line cross position are equal to each other, an image shift amount extraction device (210), and a feedback determination device (211) which determines whether or not changing an excitation amount of the aberration corrector is necessary whether or not changing an excitation amount is necessary from an extracted image shift amount.
Public/Granted literature
- US20180190469A1 ABERRATION CORRECTION METHOD, ABERRATION CORRECTION SYSTEM, AND CHARGED PARTICLE BEAM APPARATUS Public/Granted day:2018-07-05
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