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公开(公告)号：US09443695B2
公开(公告)日：2016-09-13
申请号：US14759782
申请日：2013-12-11
Applicant: HITACHI HIGH-TECHNOLOGIES CORPORATION
Inventor： Takeyoshi Ohashi , Yasunari Sohda , Noritsugu Takahashi , Hajime Kawano , Osamu Komuro
IPC: H01J37/28 , H01J37/21 , H01J37/22 , H01J37/20 , H01J37/147
CPC classification number: H01J37/222 , H01J37/1472 , H01J37/1475 , H01J37/20 , H01J37/28 , H01J2237/1536 , H01J2237/221 , H01J2237/2448 , H01J2237/2806 , H01J2237/2809 , H01J2237/2817
Abstract: This charged-particle beam device changes conditions for combining an intensity ratio between upper and lower deflectors and rotation angles of the deflectors in multiple ways when obtaining images having different pixel sizes in the vertical and horizontal directions. Then, the charged-particle beam device determines an optimal intensity ratio between the upper and lower deflectors and rotation angles of the deflectors on the basis of variations in size value measured in the larger pixel size direction (Y-direction) of the image. As a result, it is possible to extend the field of view in the Y-direction while reducing deflection aberrations when measuring at high precision in the X-direction.
Abstract translation: 当获得在垂直和水平方向上具有不同像素尺寸的图像时，该带电粒子束装置改变用于以多种方式组合上偏导器和下偏转器之间的强度比和偏转器的旋转角度的条件。 然后，带电粒子束装置基于在图像的较大像素尺寸方向（Y方向）上测量的尺寸值的变化，确定偏转器的上下偏转器之间的最佳强度比和偏转器的旋转角度。 结果，可以在X方向上以高精度测量的同时在Y方向上延伸视场，同时减少偏转像差。
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2.发明申请MEASUREMENT METHOD, IMAGE PROCESSING DEVICE, AND CHARGED PARTICLE BEAM APPARATUS 有权测量方法，图像处理装置和充电颗粒光束装置公开(公告)号：US20150110406A1
公开(公告)日：2015-04-23
申请号：US14404499
申请日：2013-05-27
Applicant: Hitachi High-Technologies Corporation
Inventor： Takeyoshi Ohashi , Junichi Tanaka , Yutaka Hojo , Hiroyuki Shindo , Hiroki Kawada
IPC: G06K9/46
CPC classification number: G06K9/4604 , G06K9/4638 , G06K2209/19 , H01J37/222 , H01J37/28 , H01J2237/24592 , H01J2237/2817
Abstract: An error of an outline point due to a brightness fluctuation cannot be corrected by a simple method such as a method of adding a certain amount of offset. However, in recent years as the miniaturization of the pattern represented by a resist pattern has progressed, it has been difficult to appropriately determine a region that serves as a reference. An outline of the resist pattern is extracted from an image of the resist pattern obtained by a charged particle beam apparatus in consideration of influence of the brightness fluctuation. That is, a plurality of brightness profiles in the vicinity of edge points configuring the outline are obtained and an evaluation value of a shape of the brightness profile in the vicinity of a specific edge is obtained based on the plurality of brightness profiles, and the outline of a specific edge point is corrected, based on the evaluation value.
Abstract translation: 由于亮度波动导致的轮廓点的误差不能通过添加一定量的偏移量的方法等简单的方法来校正。 然而，近年来，随着抗蚀剂图案表示的图案的小型化进行，难以适当地确定作为基准的区域。 考虑到亮度波动的影响，从由带电粒子束装置得到的抗蚀剂图案的图像中提取抗蚀剂图案的轮廓。 也就是说，获得构成轮廓的边缘点附近的多个亮度轮廓，并且基于多个亮度轮廓获得特定边缘附近的亮度轮廓的形状的评估值，并且轮廓 基于评估值来校正特定边缘点。
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3.发明授权公开(公告)号：US10446361B2
公开(公告)日：2019-10-15
申请号：US15741038
申请日：2015-07-01
Applicant: HITACHI HIGH-TECHNOLOGIES CORPORATION
Inventor： Zhaohui Cheng , Tomonori Nakano , Kotoko Urano , Takeyoshi Ohashi , Yasunari Sohda , Hideyuki Kazumi
IPC: H01J37/153 , H01J37/141 , H01J37/147 , H01J37/22 , H01J37/244 , H01J37/28
Abstract: In order to provide an aberration correction system that realizes a charged particle beam of which the anisotropy is reduced or eliminated on a sample surface even in the case where there is magnetic interference between pole stages of an aberration corrector, an correction system includes a line cross position control device (209) which controls a line cross position in the aberration corrector of the charged particle beam so that a designed value and an actually measured value of the line cross position are equal to each other, an image shift amount extraction device (210), and a feedback determination device (211) which determines whether or not changing an excitation amount of the aberration corrector is necessary whether or not changing an excitation amount is necessary from an extracted image shift amount.
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公开(公告)号：US20150034836A1
公开(公告)日：2015-02-05
申请号：US14445056
申请日：2014-07-29
Applicant: Hitachi High-Technologies Corporation
Inventor： Yasunari Sohda , Takeyoshi Ohashi , Takafumi Miwa , Hajime Kawano
CPC classification number: G21K1/093 , H01J37/28 , H01J2237/12 , H01J2237/14 , H01J2237/1534
Abstract: To improve the efficiency of generation of chromatic aberrations of an energy filter for reducing energy distribution. Mounted are an energy filter for primary electrons, the energy filter having a beam slit and a pair of a magnetic deflector and an electrostatic deflector that are superimposed with each other. An electron lens is arranged between the beam slit and the pair of the magnetic deflector and the electrostatic deflector.
Abstract translation: 提高能量过滤器的色差产生效率，以减少能量分布。 安装有用于一次电子的能量过滤器，能量过滤器具有光束狭缝和彼此重叠的一对磁偏转器和静电偏转器。 电子透镜设置在光束狭缝和一对磁偏转器和静电偏转器之间。
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公开(公告)号：US09543053B2
公开(公告)日：2017-01-10
申请号：US14445056
申请日：2014-07-29
Applicant: Hitachi High-Technologies Corporation
Inventor： Yasunari Sohda , Takeyoshi Ohashi , Takafumi Miwa , Hajime Kawano
CPC classification number: G21K1/093 , H01J37/28 , H01J2237/12 , H01J2237/14 , H01J2237/1534
Abstract: To improve the efficiency of generation of chromatic aberrations of an energy filter for reducing energy distribution. Mounted are an energy filter for primary electrons, the energy filter having a beam slit and a pair of a magnetic deflector and an electrostatic deflector that are superimposed with each other. An electron lens is arranged between the beam slit and the pair of the magnetic deflector and the electrostatic deflector.
Abstract translation: 提高能量过滤器的色差产生效率，以减少能量分布。 安装有用于一次电子的能量过滤器，能量过滤器具有光束狭缝和彼此重叠的一对磁偏转器和静电偏转器。 电子透镜设置在光束狭缝和一对磁偏转器和静电偏转器之间。
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Patent Agency Ranking
6.发明授权Measuring method, data processing apparatus and electron microscope using same 有权测量方法，数据处理设备和电子显微镜使用相同公开(公告)号：US09305744B2
公开(公告)日：2016-04-05
申请号：US14349375
申请日：2012-09-27
Applicant: Hitachi High-Technologies Corporation
Inventor： Takeyoshi Ohashi , Junichi Tanaka , Tomoko Sekiguchi , Hiroki Kawada
CPC classification number: H01J37/28 , G01B15/04 , G01B2210/56 , G01N23/22 , H01J2237/24578 , H01J2237/2817
Abstract: The objective of the invention is to provide a measuring method that can determine pattern contours and dimensions with high precision even if an object to be measured shrinks due to electron beam radiations. In order to achieve this objective, a method, which performs measurements by irradiating an electron beam onto a sample having a pattern formed on a primary coating thereof, prepares an SEM image and contour of the pattern (S201, S202), material parameters of the pattern part and primary coating part of the sample (S203, S204), and a beam condition in irradiating the electron beam onto the sample (S205), and uses these prepared things to calculate a pattern shape or dimensions before the irradiation of the electron beam (S206).
Abstract translation: 本发明的目的是提供一种能够以高精度确定图形轮廓和尺寸的测量方法，即使被测量物体由于电子束辐射而收缩。 为了实现该目的，通过将电子束照射到形成在其一次涂层上的图案的样品上进行测量的方法准备SEM图像和图案的轮廓（S201，S202），材料参数 样品的图案部分和初次涂布部分（S203，S204），以及将电子束照射到样品上的光束条件（S205），并且使用这些制备的物体来计算电子束照射之前的图案形状或尺寸 （S206）。
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公开(公告)号：US10134558B2
公开(公告)日：2018-11-20
申请号：US15123828
申请日：2015-02-04
Applicant: Hitachi High-Technologies Corporation
Inventor： Yasunari Sohda , Takeyoshi Ohashi , Takafumi Miwa , Noritsugu Takahashi , Hajime Kawano
Abstract: A scanning electron microscope according to the present invention includes: an electron source that produces an electron beam; a trajectory dispersion unit that disperses the trajectory of an electron beam of electrons with a different energy value; a selection slit plate having a selection slit that selects the energy range of the dispersed electron beam; and a transmittance monitoring unit that monitors the transmittance of an electron beam, which is being transmitted through the selection slit. Accordingly, there can be provided a scanning electron microscope equipped with an energy filter that implements a stable reduction in energy distribution.
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8.发明授权Measurement method, image processing device, and charged particle beam apparatus 有权测量方法，图像处理装置和带电粒子束装置公开(公告)号：US09536170B2
公开(公告)日：2017-01-03
申请号：US14404499
申请日：2013-05-27
Applicant: Hitachi High-Technologies Corporation
Inventor： Takeyoshi Ohashi , Junichi Tanaka , Yutaka Hojo , Hiroyuki Shindo , Hiroki Kawada
CPC classification number: G06K9/4604 , G06K9/4638 , G06K2209/19 , H01J37/222 , H01J37/28 , H01J2237/24592 , H01J2237/2817
Abstract: An error of an outline point due to a brightness fluctuation cannot be corrected by a simple method such as a method of adding a certain amount of offset. However, in recent years as the miniaturization of the pattern represented by a resist pattern has progressed, it has been difficult to appropriately determine a region that serves as a reference. An outline of the resist pattern is extracted from an image of the resist pattern obtained by a charged particle beam apparatus in consideration of influence of the brightness fluctuation. That is, a plurality of brightness profiles in the vicinity of edge points configuring the outline are obtained and an evaluation value of a shape of the brightness profile in the vicinity of a specific edge is obtained based on the plurality of brightness profiles, and the outline of a specific edge point is corrected, based on the evaluation value.
Abstract translation: 由于亮度波动导致的轮廓点的误差不能通过添加一定量的偏移量的方法等简单的方法来校正。 然而，近年来，随着抗蚀剂图案表示的图案的小型化进行，难以适当地确定作为基准的区域。 考虑到亮度波动的影响，从由带电粒子束装置得到的抗蚀剂图案的图像中提取抗蚀剂图案的轮廓。 也就是说，获得构成轮廓的边缘点附近的多个亮度轮廓，并且基于多个亮度轮廓获得特定边缘附近的亮度轮廓的形状的评估值，并且轮廓 基于评估值来校正特定边缘点。
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9.发明授权公开(公告)号：US09287084B2
公开(公告)日：2016-03-15
申请号：US14607736
申请日：2015-01-28
Applicant: Hitachi High-Technologies Corporation
Inventor： Zhaohui Cheng , Hideo Kashima , Hiroaki Baba , Takeyoshi Ohashi , Tomonori Nakano , Kotoko Urano , Naomasa Suzuki
IPC: G21K1/093 , H01J3/24 , H01J37/153
CPC classification number: H01J37/153 , H01J2237/032 , H01J2237/1534
Abstract: Provided are an aberration corrector that reduces irregularity of a magnetic field of a multipole to obtain an image of high resolution and a charged particle beam apparatus using the same. The aberration corrector includes a plurality of magnetic field type poles, a ring that magnetically connects the plurality of poles with one another and an adjustment member disposed between the pole and the ring to adjust a spacing between the pole and the ring per pole.
Abstract translation: 提供了减少多极的磁场的不规则性以获得高分辨率的图像和使用其的带电粒子束装置的像差校正器。 像差校正器包括多个磁场型磁极，将多个磁极彼此磁连接的环和设置在磁极和环之间的调节构件，以调节磁极与每个磁极之间的间隔。
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10.发明授权公开(公告)号：US10727024B2
公开(公告)日：2020-07-28
申请号：US16325613
申请日：2016-08-23
Applicant: HITACHI HIGH-TECHNOLOGIES CORPORATION
Inventor： Kotoko Urano , Zhaohui Cheng , Takeyoshi Ohashi , Hideyuki Kazumi
IPC: H01J37/153 , H01J37/22 , H01J37/244
Abstract: A charged particle beam device using a multi-pole type aberration corrector includes: a charged particle source which generates a primary charged particle beam; an aberration correction optical system which corrects aberrations of the primary charged particle beam; a detection unit which detects a secondary charged particle generated from a sample irradiated with the primary charged particle beam whose aberrations have been corrected; an image forming unit which forms a charged particle image of the sample from a signal obtained by detecting the secondary charged particle; an aberration correction amount calculation unit which processes the charged particle image, separates aberrations having different symmetries, selects an aberration to be preferentially corrected from the separated aberrations, and calculates a correction amount of the aberration correction optical system; and an aberration correction optical system control unit which controls the aberration correction optical system based on the calculated correction amount.
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