Invention Grant
- Patent Title: Photoresist compositions, intermediate products, and methods of manufacturing patterned devices and semiconductor devices
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Application No.: US16256827Application Date: 2019-01-24
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Publication No.: US10551738B2Publication Date: 2020-02-04
- Inventor: Jin Park , Hyun-Woo Kim , Jin-Kyu Han
- Applicant: SAMSUNG ELECTRONICS CO., LTD.
- Applicant Address: KR Suwon-si, Gyeonggi-do
- Assignee: Samsung Electronics Co., Ltd.
- Current Assignee: Samsung Electronics Co., Ltd.
- Current Assignee Address: KR Suwon-si, Gyeonggi-do
- Agency: Volentine, Whitt & Francos, PLLC
- Priority: KR10-2015-0175067 20151209
- Main IPC: G03F7/004
- IPC: G03F7/004 ; G03F7/039 ; G03F7/075 ; H01L21/027 ; C08G77/48 ; C07C381/12 ; H01L29/66 ; H01L21/311 ; H01L21/768 ; H01L21/3213 ; H01L29/51
Abstract:
A photoresist composition includes a photoresist polymer including a repeating unit to which a silicon-containing leaving group is combined, a photo-fluorine generator including a sulfonium fluoride, and a solvent.
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