Invention Grant
- Patent Title: Magnetic induction plasma source for semiconductor processes and equipment
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Application No.: US15909812Application Date: 2018-03-01
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Publication No.: US10593560B2Publication Date: 2020-03-17
- Inventor: Tae Seung Cho , Soonwook Jung , Junghoon Kim , Satoru Kobayashi , Kenneth D. Schatz , Soonam Park , Dmitry Lubomirsky
- Applicant: Applied Materials, Inc.
- Applicant Address: US CA Santa Clara
- Assignee: Applied Materials, Inc.
- Current Assignee: Applied Materials, Inc.
- Current Assignee Address: US CA Santa Clara
- Agency: Kilpatrick Townsend & Stockton LLP
- Main IPC: C23C16/00
- IPC: C23C16/00 ; H01L21/316 ; H01L21/3213 ; H01L21/67 ; H01L21/3105 ; H01J37/32 ; H05H1/46

Abstract:
Exemplary magnetic induction plasma systems for generating plasma products are provided. The magnetic induction plasma system may include a first plasma source including a plurality of first sections and a plurality of second sections arranged in an alternating manner and fluidly coupled with each other such that at least a portion of plasma products generated inside the first plasma source may circulate through at least one of the plurality of first sections and at least one of the plurality of second sections inside the first plasma source. Each of the plurality of second sections may include a dielectric material. The system may further include a plurality of first magnetic elements each of which may define a closed loop. Each of the plurality of second sections may define a plurality of recesses for receiving one of the plurality of first magnetic elements therein.
Public/Granted literature
- US20190272999A1 MAGNETIC INDUCTION PLASMA SOURCE FOR SEMICONDUCTOR PROCESSES AND EQUIPMENT Public/Granted day:2019-09-05
Information query
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