发明授权
- 专利标题: Gas laser apparatus
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申请号: US16178382申请日: 2018-11-01
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公开(公告)号: US10666008B2公开(公告)日: 2020-05-26
- 发明人: Natsushi Suzuki , Osamu Wakabayashi , Hiroaki Tsushima , Masanori Yashiro
- 申请人: Gigaphoton Inc.
- 申请人地址: JP Tochigi
- 专利权人: Gigaphoton Inc.
- 当前专利权人: Gigaphoton Inc.
- 当前专利权人地址: JP Tochigi
- 代理机构: Studebaker & Brackett PC
- 优先权: com.zzzhc.datahub.patent.etl.us.BibliographicData$PriorityClaim@4d4746b7
- 主分类号: H01S3/036
- IPC分类号: H01S3/036 ; H01S3/104 ; H01S3/225 ; B01D53/34 ; B01D53/82 ; H01S3/23 ; B01D53/04 ; B01D53/68 ; B01D53/86
摘要:
A gas supply system may include a first gas supply line, a second gas supply line, a circulation gas pipe, a gas purification unit, a first valve, and a second valve. The first gas supply line may include a first branching point at which the first gas supply line branches into a first branch connected to a first chamber and a second branch connected to a second chamber and the second gas supply line may include a second branching point at which the second gas supply line branches into a third branch connected to the first chamber and a fourth branch connected to the second chamber. A first portion of the first gas supply line upstream from the first branching point and a second portion of the second gas supply line upstream from the second branching point may be constituted by separate pipes from each other.
公开/授权文献
- US20190074655A1 GAS LASER APPARATUS 公开/授权日:2019-03-07