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公开(公告)号：US10666008B2
公开(公告)日：2020-05-26
申请号：US16178382
申请日：2018-11-01
申请人： Gigaphoton Inc.
IPC分类号： H01S3/036 , H01S3/104 , H01S3/225 , B01D53/34 , B01D53/82 , H01S3/23 , B01D53/04 , B01D53/68 , B01D53/86
摘要： A gas supply system may include a first gas supply line, a second gas supply line, a circulation gas pipe, a gas purification unit, a first valve, and a second valve. The first gas supply line may include a first branching point at which the first gas supply line branches into a first branch connected to a first chamber and a second branch connected to a second chamber and the second gas supply line may include a second branching point at which the second gas supply line branches into a third branch connected to the first chamber and a fourth branch connected to the second chamber. A first portion of the first gas supply line upstream from the first branching point and a second portion of the second gas supply line upstream from the second branching point may be constituted by separate pipes from each other.
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公开(公告)号：US09373926B2
公开(公告)日：2016-06-21
申请号：US14694743
申请日：2015-04-23
申请人： GIGAPHOTON INC.
IPC分类号： H01S3/036 , F16C33/66 , F16C32/04 , H01S3/134 , H01S3/225 , H01S3/038 , H01S3/097 , H01S3/223 , H01S3/104 , F16C19/06 , H01S3/0971 , H01S3/1055
CPC分类号： H01S3/036 , F16C19/06 , F16C32/0402 , F16C32/0406 , F16C33/6696 , F16C2204/02 , F16C2204/10 , F16C2204/52 , F16C2240/40 , F16C2360/46 , H01S3/038 , H01S3/097 , H01S3/0971 , H01S3/104 , H01S3/1055 , H01S3/134 , H01S3/2232 , H01S3/225 , H01S3/2251 , H01S3/2256
摘要： There is provided a laser chamber housing a pair of discharge electrodes and a gas circulation fun, the laser chamber including: a magnetic bearing configured to support a shaft of the gas circulation fan, with the shaft being in non-contact with the magnetic bearing; and a touchdown bearing configured to operate as a bearing when the magnetic bearing is uncontrollable, the touchdown bearing being provided with solid lubricant configured of one or more of an Au plating layer, a Ni-containing plating layer, and a Cu plating layer.
摘要翻译： 提供了容纳一对放电电极和气体循环功能的激光室，所述激光室包括：支撑所述气体循环风扇的轴的磁性轴承，所述轴与所述磁性轴承不接触; 以及触控轴承，其构造为当所述磁性轴承不受控制时作为轴承进行操作，所述触地轴承设置有由Au镀层，含Ni镀层和Cu镀层中的一种或多种构成的固体润滑剂。
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公开(公告)号：US11081850B2
公开(公告)日：2021-08-03
申请号：US16853489
申请日：2020-04-20
申请人： Gigaphoton Inc.
IPC分类号： H01S3/036 , H01S3/104 , H01S3/225 , B01D53/34 , B01D53/82 , H01S3/23 , B01D53/04 , B01D53/68 , B01D53/86
摘要： A gas laser apparatus may include: a laser chamber connected through a first control valve to a first laser gas supply source that supplies a first laser gas containing a halogen gas; a purification column that removes at least a part of the halogen gas and a halogen compound from at least a part of a gas exhausted from the laser chamber; a booster pump; and a controller that calculates, on a basis of a first amount of a gas supplied from the booster pump to the laser chamber, a second amount of the first laser gas that is to be supplied to the laser chamber and controls the first control valve on a basis of a result of the calculation of the second amount.
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公开(公告)号：US10892592B2
公开(公告)日：2021-01-12
申请号：US15953835
申请日：2018-04-16
申请人： Gigaphoton Inc.
摘要： A laser gas purifying system to purify laser gas emitted from a laser apparatus and return purified gas to the laser apparatus may include a first pipe configured to pass the laser gas emitted from the laser apparatus, a purifying apparatus connected to the first pipe and configured to purify the laser gas emitted from the laser apparatus, a second pipe connected to the purifying apparatus and configured to return the purified gas purified by the purifying apparatus to the laser apparatus, and an exhausting device provided in at least one of the first pipe, the purifying apparatus, and the second pipe.
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公开(公告)号：US10038295B2
公开(公告)日：2018-07-31
申请号：US15631676
申请日：2017-06-23
申请人： Gigaphoton Inc.
IPC分类号： H01S3/036 , H01S3/104 , H01S3/225 , B01D53/04 , B01D53/34 , B01D53/82 , B01D53/86 , B01D53/68
CPC分类号： H01S3/036 , B01D53/0446 , B01D53/346 , B01D53/685 , B01D53/82 , B01D53/86 , B01D2251/404 , B01D2251/602 , B01D2253/108 , B01D2255/20753 , B01D2255/20761 , B01D2257/2027 , B01D2258/0216 , B01D2259/40003 , H01S3/104 , H01S3/225
摘要： A gas laser apparatus may include: a laser chamber connected through a first control valve to a first laser gas supply source that supplies a first laser gas containing a halogen gas and connected through a second control valve to a second laser gas supply source that supplies a second laser gas having a lower halogen gas concentration than the first laser gas; a purification column that removes at least a part of the halogen gas and a halogen compound from at least a part of a gas exhausted from the laser chamber; a booster pump, connected through a third control valve to the laser chamber, which raises a pressure of a gas having passed through the purification column to a gas pressure that is higher than an operating gas pressure of the laser chamber; and a controller that calculates, on a basis of a first amount of a gas supplied from the booster pump through the third control valve to the laser chamber, a second amount of the first laser gas that is to be supplied to the laser chamber and controls the first control valve on a basis of a result of the calculation of the second amount.
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公开(公告)号：US09722384B2
公开(公告)日：2017-08-01
申请号：US15145016
申请日：2016-05-03
申请人： Gigaphoton Inc.
CPC分类号： H01S3/036 , B01D53/0446 , B01D53/346 , B01D53/685 , B01D53/82 , B01D53/86 , B01D2251/404 , B01D2251/602 , B01D2253/108 , B01D2255/20753 , B01D2255/20761 , B01D2257/2027 , B01D2258/0216 , B01D2259/40003 , H01S3/104 , H01S3/225
摘要： A gas laser apparatus may include: a laser chamber connected through a first control valve to a first laser gas supply source that supplies a first laser gas containing a halogen gas and connected through a second control valve to a second laser gas supply source that supplies a second laser gas having a lower halogen gas concentration than the first laser gas; a purification column that removes at least a part of the halogen gas and a halogen compound from at least a part of a gas exhausted from the laser chamber; a booster pump, connected through a third control valve to the laser chamber, which raises a pressure of a gas having passed through the purification column to a gas pressure that is higher than an operating gas pressure of the laser chamber; and a controller that calculates, on a basis of a first amount of a gas supplied from the booster pump through the third control valve to the laser chamber, a second amount of the first laser gas that is to be supplied to the laser chamber and controls the first control valve on a basis of a result of the calculation of the second amount.
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公开(公告)号：US10971883B2
公开(公告)日：2021-04-06
申请号：US16178351
申请日：2018-11-01
申请人： Gigaphoton Inc.
IPC分类号： H01S3/036 , H01S3/104 , H01S3/225 , B01D53/34 , B01D53/82 , H01S3/23 , B01D53/04 , B01D53/68 , B01D53/86
摘要： A gas purification system may include: a circulation gas pipe in which a second end is connected at a first position to a second pipe through which gas is supplied from a gas supply source; a booster pump; a gas purification unit; a first tank in the circulation gas pipe; a first valve positioned between the gas supply source and the first position, the first valve having an open position and a closed position; and a second valve positioned between the first tank and the second end, the second valve having an open position and a closed position, the second valve configured to be in the closed position when the first valve is in the open position.
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公开(公告)号：US09748727B2
公开(公告)日：2017-08-29
申请号：US14956709
申请日：2015-12-02
申请人： Gigaphoton Inc.
IPC分类号： H01S3/0977 , H01S3/0971 , H01S3/038 , H01S3/08
CPC分类号： H01S3/09713 , H01S3/0384 , H01S3/08009 , H01S3/0977
摘要： A preliminary ionization discharge device used in a laser chamber of a laser apparatus using preliminary ionization includes a dielectric pipe; a preliminary ionization inner electrode provided inside the dielectric pipe; and a preliminary ionization outer electrode provided outside the dielectric pipe. The preliminary ionization outer electrode includes: a contact plate part configured to contact the dielectric pipe; and an elastic part configured to exert a force in a direction in which the contact plate part pushes the dielectric pipe.
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