Gas laser apparatus
    1.
    发明授权

    公开(公告)号:US10666008B2

    公开(公告)日:2020-05-26

    申请号:US16178382

    申请日:2018-11-01

    申请人: Gigaphoton Inc.

    摘要: A gas supply system may include a first gas supply line, a second gas supply line, a circulation gas pipe, a gas purification unit, a first valve, and a second valve. The first gas supply line may include a first branching point at which the first gas supply line branches into a first branch connected to a first chamber and a second branch connected to a second chamber and the second gas supply line may include a second branching point at which the second gas supply line branches into a third branch connected to the first chamber and a fourth branch connected to the second chamber. A first portion of the first gas supply line upstream from the first branching point and a second portion of the second gas supply line upstream from the second branching point may be constituted by separate pipes from each other.

    Laser gas regenerating apparatus and electronic device manufacturing method

    公开(公告)号:US11451003B2

    公开(公告)日:2022-09-20

    申请号:US17009160

    申请日:2020-09-01

    申请人: Gigaphoton Inc.

    IPC分类号: H01S3/036 G03F7/20 H01S3/225

    摘要: A laser gas regenerating apparatus regenerates a discharged gas discharged from at least one ArF excimer laser apparatus and supplies the regenerated gas to the at least one ArF excimer laser apparatus connected to a first laser gas supply source that supplies a first laser gas and to a second laser gas supply source that supplies a second laser gas. The laser gas regenerating apparatus includes a data obtaining unit that obtains data on a supply amount of the second laser gas supplied to the at least one ArF excimer laser apparatus; a xenon adding unit that adds, to the regenerated gas, a third laser gas; and a control unit that controls, based on the supply amount, an addition amount of the third laser gas by the xenon adding unit.