Invention Grant
- Patent Title: Source supplier for a supercritical fluid, substrate processing apparatus having the same
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Application No.: US15482549Application Date: 2017-04-07
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Publication No.: US10668403B2Publication Date: 2020-06-02
- Inventor: Jung-Min Oh , Ji-Hoon Jeong , Dong-Gyun Han , Kun-Tack Lee , Hyo-San Lee , Yong-Myung Jun
- Applicant: SAMSUNG ELECTRONICS CO., LTD.
- Applicant Address: KR Suwon-si, Gyeonggi-Do
- Assignee: SAMSUNG ELECTRONICS CO., LTD.
- Current Assignee: SAMSUNG ELECTRONICS CO., LTD.
- Current Assignee Address: KR Suwon-si, Gyeonggi-Do
- Agency: F. Chau & Associates, LLC
- Priority: com.zzzhc.datahub.patent.etl.us.BibliographicData$PriorityClaim@454d0664
- Main IPC: B01D53/02
- IPC: B01D53/02 ; B01D11/04 ; G01N21/3554 ; H01L21/67 ; H01L21/02 ; B01D11/02
Abstract:
A source supplier includes a source reservoir that contains a liquefied source fluid for a supercritical process, a vaporizer that vaporizes the liquefied source fluid into a gaseous source fluid under high pressure, a purifier that removes organic impurities and moistures from the gaseous source fluid and an analyzer connected to the purifier that analyzes an impurity fraction and a moisture fraction in the gaseous source fluid. Moisture and organic impurities are removed from the source fluid to reduce the moisture concentration of the supercritical fluid in the supercritical process.
Public/Granted literature
- US20180028936A1 SOURCE SUPPLIER FOR A SUPERCRITICAL FLUID, SUBSTRATE PROCESSING APPARATUS HAVING THE SAME Public/Granted day:2018-02-01
Information query
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