Invention Grant
- Patent Title: Anhydrous substrate cleaning composition, substrate treating method, and substrate treating apparatus
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Application No.: US15721188Application Date: 2017-09-29
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Publication No.: US10773281B2Publication Date: 2020-09-15
- Inventor: Ki-Moon Kang , Anton Koriakin , In Il Jung , Hae-Won Choi
- Applicant: SEMES CO., LTD.
- Applicant Address: KR Chungcheongnam-do
- Assignee: SEMES CO., LTD.
- Current Assignee: SEMES CO., LTD.
- Current Assignee Address: KR Chungcheongnam-do
- Agency: Procopio, Cory, Hargreaves & Savitch LLP
- Priority: com.zzzhc.datahub.patent.etl.us.BibliographicData$PriorityClaim@2040473e
- Main IPC: C11D7/50
- IPC: C11D7/50 ; B08B7/00 ; H01L21/67 ; C11D11/00 ; H01L21/311 ; C07C31/02
Abstract:
Disclosed are an anhydrous substrate cleaning composition, a substrate treating method, and a substrate treating apparatus. The substrate cleaning composite includes an etching compound that provides a component for treating a substrate, and a solvent that dissolves the etching compound, wherein the substrate cleaning composite is an anhydrous composite that does not include water.
Public/Granted literature
- US20180093306A1 ANHYDROUS SUBSTRATE CLEANING COMPOSITION, SUBSTRATE TREATING METHOD, AND SUBSTRATE TREATING APPARATUS Public/Granted day:2018-04-05
Information query
