- 专利标题: Mask for thin film deposition, method of manufacturing the same, and method of manufacturing a display apparatus using the same
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申请号: US15865141申请日: 2018-01-08
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公开(公告)号: US10790447B2公开(公告)日: 2020-09-29
- 发明人: Youngmin Moon , Sungsoon Im , Jeongkuk Kim , Minho Moon , Kyuhwan Hwang
- 申请人: Samsung Display Co., Ltd.
- 申请人地址: KR Yongin-si
- 专利权人: Samsung Display Co., Ltd.
- 当前专利权人: Samsung Display Co., Ltd.
- 当前专利权人地址: KR Yongin-si
- 代理机构: H.C. Park & Associates, PLC
- 优先权: com.zzzhc.datahub.patent.etl.us.BibliographicData$PriorityClaim@7649e475
- 主分类号: H01L51/00
- IPC分类号: H01L51/00 ; H01L27/32 ; H01L51/56 ; C25D1/20 ; C25D1/10 ; C23C16/04 ; C23C4/04 ; B23K26/50 ; G03F7/20 ; C23C14/04 ; G03F7/16 ; G03F7/26 ; C25D1/08 ; C23C14/12 ; G03F7/12
摘要:
A mask for thin film deposition of a display apparatus having both end portions coupleable to a frame in a state of tension in a lengthwise direction thereof, the mask including: a first portion having a first thickness and a plurality of pattern holes through which a deposition material may pass; a second portion comprising a welding portion having a second thickness configured to be coupled to a frame; and a third portion connecting the first portion and the third portion, wherein the first thickness is less than the second thickness, and the third portion includes an inclined surface connecting the first portion and the second portion.