Invention Grant
- Patent Title: Advanced in-situ particle detection system for semiconductor substrate processing systems
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Application No.: US16455689Application Date: 2019-06-27
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Publication No.: US10883932B2Publication Date: 2021-01-05
- Inventor: Lin Zhang , Xuesong Lu , Andrew V. Le , Fa Ji , Jang Seok Oh , Patrick L. Smith , Shawyon Jafari , Ralph Peter Antonio
- Applicant: Applied Materials, Inc.
- Applicant Address: US CA Santa Clara
- Assignee: Applied Materials, Inc.
- Current Assignee: Applied Materials, Inc.
- Current Assignee Address: US CA Santa Clara
- Agency: Patterson + Sheridan LLP
- Main IPC: G01N21/53
- IPC: G01N21/53 ; G01N1/22 ; H01L21/67 ; H01L21/677 ; G01N15/00 ; G01N15/06 ; G01N15/02

Abstract:
An FI having an in-situ particle detector and a method for particle detection therein are provided. In one aspect, the FI includes a fan, a substrate support, a particle detector, and an exhaust outlet. The fan, substrate support, and particle detector are arranged such that, in operation, the fan directs air towards the exhaust outlet and over a substrate on the substrate support to create laminar flow. The particle detector, positioned downstream from the substrate support and upstream from the exhaust outlet, analyzes the air and detects particle concentration before the particles are exhausted. The collected particle detection data may be combined with data from other sensors in the FI and used to identify the source of particle contamination. The particle detector may also be incorporated into other system components, including but not limited to, a load-lock or buffer chamber to detect particle concentration therein.
Public/Granted literature
- US20190323960A1 ADVANCED IN-SITU PARTICLE DETECTION SYSTEM FOR SEMICONDUCTOR SUBSTRATE PROCESSING SYSTEMS Public/Granted day:2019-10-24
Information query
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