Invention Grant
- Patent Title: Manufacturing method of III-V compound crystal and manufacturing method of semiconductor device
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Application No.: US16135679Application Date: 2018-09-19
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Publication No.: US10910511B2Publication Date: 2021-02-02
- Inventor: Yusuke Mori , Masashi Yoshimura , Mamoru Imade , Masayuki Imanishi , Hiroshi Morikazu , Shin Tabata , Takumi Shotokuji
- Applicant: DISCO CORPORATION , OSAKA UNIVERSITY
- Applicant Address: JP Tokyo; JP Suita
- Assignee: DISCO CORPORATION,OSAKA UNIVERSITY
- Current Assignee: DISCO CORPORATION,OSAKA UNIVERSITY
- Current Assignee Address: JP Tokyo; JP Suita
- Agency: Greer Burns & Crain Ltd.
- Priority: JP2017-181815 20170921
- Main IPC: H01L33/18
- IPC: H01L33/18 ; H01L33/00 ; C30B25/02 ; C30B19/02 ; C30B33/06 ; C30B29/40 ; H01L33/32 ; H01L33/02

Abstract:
There is provided a manufacturing method of a III-V compound crystal including a seed-crystal-formed substrate provision step of providing a seed-crystal-formed substrate in which a III-V compound seed crystal has been formed on a substrate, a seed crystal partial separation step of separating part of a portion in contact with the substrate in the III-V compound seed crystal from the substrate, and a crystal growth step of generating and growing the III-V compound crystal by reacting a group III element and a group V element with use of the III-V compound seed crystal as a nucleus after the seed crystal partial separation step.
Public/Granted literature
- US20190088816A1 MANUFACTURING METHOD OF III-V COMPOUND CRYSTAL AND MANUFACTURING METHOD OF SEMICONDUCTOR DEVICE Public/Granted day:2019-03-21
Information query
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