- Patent Title: Method for producing cationically modified silica, cationically modified silica dispersion, method for producing polishing composition using cationically modified silica, and polishing composition using cationically modified silica
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Application No.: US16338002Application Date: 2017-09-05
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Publication No.: US10941318B2Publication Date: 2021-03-09
- Inventor: Souma Taguchi , Keiji Ashitaka , Naoya Miwa
- Applicant: FUJIMI INCORPORATED
- Applicant Address: JP Kiyosu
- Assignee: FUJIMI INCORPORATED
- Current Assignee: FUJIMI INCORPORATED
- Current Assignee Address: JP Kiyosu
- Agency: Foley & Lardner LLP
- Priority: JPJP2016-193604 20160930
- International Application: PCT/JP2017/031956 WO 20170905
- International Announcement: WO2018/061656 WO 20180405
- Main IPC: C09G1/02
- IPC: C09G1/02 ; C01B33/146 ; C09K3/14 ; H01L21/304 ; B24B37/00 ; H01L21/321 ; H01L21/306 ; H01L21/3105 ; B24B37/04

Abstract:
To provide a means capable of suppressing the generation of gelation at the time of or after the addition of a silane coupling agent in the production of a cationically modified silica including modifying a silica raw material with a silane coupling agent. The present invention is a method for producing a cationically modified silica, including: mixing a silica raw material having a negative zeta potential with a silane coupling agent having an amino group or a quaternary cationic group; and reacting the silica raw material with the silane coupling agent to obtain a cationically modified silica, in which the cationically modified silica satisfies the following relational expression (1): X
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