Invention Grant
- Patent Title: Mask cleaning apparatus and method for cleaning mask
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Application No.: US16158698Application Date: 2018-10-12
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Publication No.: US10942446B2Publication Date: 2021-03-09
- Inventor: Seong Soo Lee , Jeong Yeong Park , Sung Bum Park , Byung Chul Kang
- Applicant: SEMES CO., LTD.
- Applicant Address: KR Chungcheongnam-do
- Assignee: SEMES CO., LTD.
- Current Assignee: SEMES CO., LTD.
- Current Assignee Address: KR Chungcheongnam-do
- Agency: Carter, Deluca & Farrell LLP
- Priority: KR10-2017-0133812 20171016
- Main IPC: G03F1/82
- IPC: G03F1/82 ; G03F7/20 ; H01L21/02 ; H01L21/311 ; H01L21/67
Abstract:
Disclosed is a method for cleaning a photo mask. The method includes a pre-treatment operation of wetting a chemical on an entire surface of the photo mask in a state in which the photo mask is stopped, and a cleaning operation of supplying the chemical to a pattern area of the photo mask in a state in which the photo mask is rotated.
Public/Granted literature
- US20190113839A1 MASK CLEANING APPARATUS AND METHOD FOR CLEANING MASK Public/Granted day:2019-04-18
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