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公开(公告)号：US20190113839A1
公开(公告)日：2019-04-18
申请号：US16158698
申请日：2018-10-12
Applicant: SEMES CO., LTD.
Inventor： Seong Soo Lee , Jeong Yeong Park , Sung Bum Park , Byung Chul Kang
Abstract: Disclosed is a method for cleaning a photo mask. The method includes a pre-treatment operation of wetting a chemical on an entire surface of the photo mask in a state in which the photo mask is stopped, and a cleaning operation of supplying the chemical to a pattern area of the photo mask in a state in which the photo mask is rotated.
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2.发明申请公开(公告)号：US20130284367A1
公开(公告)日：2013-10-31
申请号：US13873304
申请日：2013-04-30
Applicant: SEMES CO., LTD.
Inventor： Byung Chul Kang , Bong Joo Kim , Byung Man Kang , Young Ho Choo
CPC classification number: B05C11/1042 , B05D1/00 , H01L21/67017 , H01L21/6715 , Y10T137/0329
Abstract: Provided is a substrate processing apparatus. The apparatus includes a processing chamber containing a substrate and processing the substrate by using a processing solution and a supplying unit supplying the processing solution to the processing chamber. The supplying unit includes a supply line through which the processing solution is supplied, a preliminary heater installed on the supply line and preliminary heating the processing solution, a main heater installed on the supply line at a lower stream of the preliminary heater and secondarily heating the processing solution, a first detour line connected to the supply line to detour to the preliminary heater and comprising a first valve, a second detour line connected to the supply line to detour the preliminary heater and the main heater or the main heater and comprising a second valve, and a controller controlling the first valve and the second valve.
Abstract translation: 提供了一种基板处理装置。 所述装置包括处理室，所述处理室包含基板并通过使用处理溶液和将所述处理溶液供应到所述处理室的供应单元来处理所述基板。 供给单元包括供给管线，通过该供给管路供给处理液，将预热加热器安装在供给管路上，对该处理液进行预加热，将主加热器安装在预热器的下游的供给管路上， 连接到所述供应管线以绕行到所述预加热器的第一绕线，包括第一阀，连接到所述供应管线的第二绕行线，以绕过所述预加热器和所述主加热器或所述主加热器并且包括第二阀 阀，以及控制第一阀和第二阀的控制器。
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公开(公告)号：US10942446B2
公开(公告)日：2021-03-09
申请号：US16158698
申请日：2018-10-12
Applicant: SEMES CO., LTD.
Inventor： Seong Soo Lee , Jeong Yeong Park , Sung Bum Park , Byung Chul Kang
IPC: G03F1/82 , G03F7/20 , H01L21/02 , H01L21/311 , H01L21/67
Abstract: Disclosed is a method for cleaning a photo mask. The method includes a pre-treatment operation of wetting a chemical on an entire surface of the photo mask in a state in which the photo mask is stopped, and a cleaning operation of supplying the chemical to a pattern area of the photo mask in a state in which the photo mask is rotated.
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公开(公告)号：US09892939B2
公开(公告)日：2018-02-13
申请号：US13664844
申请日：2012-10-31
Applicant: Semes Co., Ltd.
Inventor： Jaeryung Ryu , Dong Soon Hwang , Byung Chul Kang
CPC classification number: H01L21/67017 , H01L21/67051
Abstract: Provided is a substrate treating apparatus. The substrate treating apparatus according to embodiments of the present invention may include a cleaning chamber cleaning foreign objects on a substrate, and a recycling unit recycling by recovering a mixed solution including a first chemical and a second chemical used in cleaning of the substrate, wherein the recycling unit includes a separation unit separating the mixed solution recovered from the cleaning chamber, a recovery line connecting the separation unit and the cleaning chamber and allowing the mixed solution to flow into the separation unit, a decompression line having one end connected to the separation unit and exhausting the mixed solution evaporated from the separation unit, and a decompression unit installed in the decompression line and reducing pressure in the separation unit.
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