Invention Grant
- Patent Title: Gas laser apparatus
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Application No.: US16178351Application Date: 2018-11-01
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Publication No.: US10971883B2Publication Date: 2021-04-06
- Inventor: Natsushi Suzuki , Osamu Wakabayashi , Hiroaki Tsushima , Masanori Yashiro
- Applicant: Gigaphoton Inc.
- Applicant Address: JP Tochigi
- Assignee: Gigaphoton Inc.
- Current Assignee: Gigaphoton Inc.
- Current Assignee Address: JP Tochigi
- Agency: Studebaker & Brackett PC
- Priority: WOPCT/JP2013/081651 20131125
- Main IPC: H01S3/036
- IPC: H01S3/036 ; H01S3/104 ; H01S3/225 ; B01D53/34 ; B01D53/82 ; H01S3/23 ; B01D53/04 ; B01D53/68 ; B01D53/86

Abstract:
A gas purification system may include: a circulation gas pipe in which a second end is connected at a first position to a second pipe through which gas is supplied from a gas supply source; a booster pump; a gas purification unit; a first tank in the circulation gas pipe; a first valve positioned between the gas supply source and the first position, the first valve having an open position and a closed position; and a second valve positioned between the first tank and the second end, the second valve having an open position and a closed position, the second valve configured to be in the closed position when the first valve is in the open position.
Public/Granted literature
- US20190081449A1 GAS LASER APPARATUS Public/Granted day:2019-03-14
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