Invention Grant
- Patent Title: Substrate coating apparatus for floating substrate and method
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Application No.: US15889276Application Date: 2018-02-06
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Publication No.: US10991608B2Publication Date: 2021-04-27
- Inventor: Yousuke Mine , Kazuhito Miyazaki
- Applicant: Tokyo Electron Limited
- Applicant Address: JP Tokyo
- Assignee: Tokyo Electron Limited
- Current Assignee: Tokyo Electron Limited
- Current Assignee Address: JP Tokyo
- Agency: Abelman, Frayne & Schwab
- Priority: JPJP2017-023282 20170210
- Main IPC: H01L21/677
- IPC: H01L21/677 ; B05C13/02 ; B65G47/24 ; F16C29/00 ; H01L21/67 ; B25B11/00 ; G03F7/20 ; H01L51/56 ; B05C5/02 ; H01L51/00 ; B41J2/01 ; H01L27/32

Abstract:
Provided is a coating apparatus including: a stage unit which floats the substrate to a predetermined height by using wind pressure of gas; a droplet discharge unit which drops the droplet of the functional liquid on the substrate floated to the predetermined height from the stage unit; a main scanning direction moving unit which moves the substrate, which is floated to the predetermined height from the stage unit, in the main scanning direction while holding the substrate; and a sub-scanning direction moving unit which moves the droplet discharge unit in the sub-scanning direction with respect to the substrate floated to the predetermined height from the stage unit. The sub-scanning direction moving unit moves the droplet discharge unit in the sub-scanning direction while the main scanning direction moving unit repeatedly moves the substrate in the main scanning direction and the droplet discharge unit repeatedly drops the droplet.
Public/Granted literature
- US20180233707A1 COATING APPARATUS AND COATING METHOD Public/Granted day:2018-08-16
Information query
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