Substrate coating apparatus for floating substrate and method
Abstract:
Provided is a coating apparatus including: a stage unit which floats the substrate to a predetermined height by using wind pressure of gas; a droplet discharge unit which drops the droplet of the functional liquid on the substrate floated to the predetermined height from the stage unit; a main scanning direction moving unit which moves the substrate, which is floated to the predetermined height from the stage unit, in the main scanning direction while holding the substrate; and a sub-scanning direction moving unit which moves the droplet discharge unit in the sub-scanning direction with respect to the substrate floated to the predetermined height from the stage unit. The sub-scanning direction moving unit moves the droplet discharge unit in the sub-scanning direction while the main scanning direction moving unit repeatedly moves the substrate in the main scanning direction and the droplet discharge unit repeatedly drops the droplet.
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