Invention Grant
- Patent Title: Method for producing base for metal masks, method for producing metal mask for vapor deposition, base for metal masks, and metal mask for vapor deposition
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Application No.: US15786446Application Date: 2017-10-17
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Publication No.: US11111585B2Publication Date: 2021-09-07
- Inventor: Naoko Mikami , Sumika Tamura , Reiji Terada , Masashi Kurata , Daisei Fujito , Kiyoaki Nishitsuji , Takehiro Nishi
- Applicant: TOPPAN PRINTING CO., LTD.
- Applicant Address: JP Tokyo
- Assignee: TOPPAN PRINTING CO., LTD.
- Current Assignee: TOPPAN PRINTING CO., LTD.
- Current Assignee Address: JP Tokyo
- Agency: Squire Patton Boggs (US) LLP
- Priority: JPJP2015-143509 20150717,JPJP2015-171440 20150831,JPJP2015-237004 20151203
- Main IPC: C23F1/28
- IPC: C23F1/28 ; C23C14/24 ; C23C14/34 ; C23F1/16 ; B21B1/22 ; B21B3/02 ; B32B15/01 ; B32B15/04 ; C23C14/04 ; C23C16/04 ; C23F1/40 ; H01L51/00

Abstract:
A rolled metal sheet includes an obverse surface and a reverse surface that is a surface located opposite to the obverse surface. At least either one of the obverse surface and the reverse surface is a processing object. A method for manufacturing a metal mask substrate includes reducing a thickness of the rolled metal sheet to 10 μm or less by etching the processing object by 3 μm or more by use of an acidic etching liquid, and roughening the processing object so that the processing object becomes a resist formation surface that has a surface roughness Rz of 0.2 μm or more, thereby obtaining a metal mask sheet.
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