公开(公告)号：US11746423B2

公开(公告)日：2023-09-05

申请号：US17390579

申请日：2021-07-30

Applicant: TOPPAN PRINTING CO., LTD.

Inventor： Naoko Mikami ,  Sumika Tamura ,  Reiji Terada ,  Masashi Kurata ,  Daisei Fujito ,  Kiyoaki Nishitsuji ,  Takehiro Nishi

IPC: C23F1/28 ,  C23C14/24 ,  C23C14/34 ,  C23F1/16 ,  H10K71/20 ,  C23F1/02 ,  C23F1/04 ,  B21B1/22 ,  B21B3/02 ,  B32B15/01 ,  B32B15/04 ,  C23C14/04 ,  C23C16/04 ,  C23F1/40

CPC classification number: C23F1/28 ,  B21B1/227 ,  B21B3/02 ,  B32B15/015 ,  B32B15/04 ,  C23C14/042 ,  C23C14/24 ,  C23C14/34 ,  C23C16/042 ,  C23F1/02 ,  C23F1/04 ,  C23F1/16 ,  C23F1/40 ,  H10K71/211 ,  B21B2261/04

Abstract: A rolled metal sheet includes an obverse surface and a reverse surface that is a surface located opposite to the obverse surface. At least either one of the obverse surface and the reverse surface is a processing object. A method for manufacturing a metal mask substrate includes reducing a thickness of the rolled metal sheet to 10 μm or less by etching the processing object by 3 μm or more by use of an acidic etching liquid, and roughening the processing object so that the processing object becomes a resist formation surface that has a surface roughness Rz of 0.2 μm or more, thereby obtaining a metal mask sheet.

公开(公告)号：US11111585B2

公开(公告)日：2021-09-07

申请号：US15786446

申请日：2017-10-17

Applicant: TOPPAN PRINTING CO., LTD.

Inventor： Naoko Mikami ,  Sumika Tamura ,  Reiji Terada ,  Masashi Kurata ,  Daisei Fujito ,  Kiyoaki Nishitsuji ,  Takehiro Nishi

IPC: C23F1/28 ,  C23C14/24 ,  C23C14/34 ,  C23F1/16 ,  B21B1/22 ,  B21B3/02 ,  B32B15/01 ,  B32B15/04 ,  C23C14/04 ,  C23C16/04 ,  C23F1/40 ,  H01L51/00

Abstract: A rolled metal sheet includes an obverse surface and a reverse surface that is a surface located opposite to the obverse surface. At least either one of the obverse surface and the reverse surface is a processing object. A method for manufacturing a metal mask substrate includes reducing a thickness of the rolled metal sheet to 10 μm or less by etching the processing object by 3 μm or more by use of an acidic etching liquid, and roughening the processing object so that the processing object becomes a resist formation surface that has a surface roughness Rz of 0.2 μm or more, thereby obtaining a metal mask sheet.

公开(公告)号：US10767266B2

公开(公告)日：2020-09-08

申请号：US16025857

申请日：2018-07-02

Applicant: TOPPAN PRINTING CO., LTD.

Inventor： Mikio Shinno ,  Reiji Terada ,  Kiyoaki Nishitsuji ,  Masashi Kurata ,  Kenta Takeda ,  Naoko Mikami ,  Sumika Akiyama

IPC: B21D1/00 ,  C23F1/02 ,  C23F1/28 ,  C23C14/24 ,  B21B1/38 ,  C23C14/04 ,  C23F1/16

Abstract: The ratio of the difference between a surface distance L at each of the different positions in a width direction DW of a metal sheet and a minimum surface distance Lm to the minimum surface distance Lm is an elongation difference ratio. The elongation difference ratio in a center section in the width direction DW of the metal sheet is less than or equal to 3×10−5. The elongation difference ratios in two edge sections in the width direction DW of the metal sheet are less than or equal to 15×10−5. The elongation difference ratio in at least one of the two edge sections in the width direction DW of the metal sheet is less than the elongation difference ratio in the center section in the width direction of the metal sheet.