- Patent Title: Optimizing an apparatus for multi-stage processing of product units
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Application No.: US16486859Application Date: 2018-02-22
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Publication No.: US11150562B2Publication Date: 2021-10-19
- Inventor: Jelle Nije , Alexander Ypma , Dimitra Gkorou , Georgios Tsirogiannis , Robert Jan Van Wijk , Tzu-Chao Chen , Frans Reinier Spiering , Sarathi Roy , Cédric Désiré Grouwstra
- Applicant: ASML NETHERLANDS B.V.
- Applicant Address: NL Veldhoven
- Assignee: ASML NETHERLANDS B.V.
- Current Assignee: ASML NETHERLANDS B.V.
- Current Assignee Address: NL Veldhoven
- Agency: Pillsbury Winthrop Shaw Pittman LLP
- Priority: EP17163147 20170327
- International Application: PCT/EP2018/054360 WO 20180222
- International Announcement: WO2018/177659 WO 20181004
- Main IPC: G03F7/20
- IPC: G03F7/20

Abstract:
A method of optimizing an apparatus for multi-stage processing of product units such as wafers, the method includes: receiving object data representing one or more parameters measured across the product units and associated with different stages of processing of the product units; and determining fingerprints of variation of the object data across the product units, the fingerprints being associated with different respective stages of processing of the product units. The fingerprints may be determined by decomposing the object data into components using principal component analysis for each different respective stage; analyzing commonality of the fingerprints through the different stages to produce commonality results; and optimizing an apparatus for processing product units based on the commonality results.
Public/Granted literature
- US20200233315A1 OPTIMIZING AN APPARATUS FOR MULTI-STAGE PROCESSING OF PRODUCT UNITS Public/Granted day:2020-07-23
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