公开(公告)号：US11099486B2

公开(公告)日：2021-08-24

申请号：US16477619

申请日：2017-12-13

Applicant: ASML NETHERLANDS B.V.

Inventor： Alexander Ypma ,  Dimitra Gkorou ,  Georgios Tsirogiannis ,  Thomas Leo Maria Hoogenboom ,  Richard Johannes Franciscus Van Haren

IPC: G03F7/20 ,  G05B19/418 ,  H01L21/66

Abstract: A technique to generate predicted data for control or monitoring of a production process to improve a parameter of interest. Context data associated with operation of the production process is obtained. Metrology/testing is performed on the product of the production process, thereby obtaining performance data. A context-to-performance model is provided to generate predicted performance data based on labeling of the context data with performance data. This is an instance of semi-supervised learning. The context-to-performance model may include the learner that performs semi-supervised labeling. The context-to-performance model is modified using prediction information related to quality of the context data and/or performance data. Prediction information may include relevance information relating to relevance of the obtained context data and/or obtained performance data to the parameter of interest. The prediction information may include model uncertainty information relating to uncertainty of the predicted performance data.

公开(公告)号：US11740560B2

公开(公告)日：2023-08-29

申请号：US17910454

申请日：2021-03-01

Applicant: ASML NETHERLANDS B.V.

Inventor： Eleftherios Koulierakis ,  Carlo Lancia ,  Juan Manuel Gonzalez Huesca ,  Alexander Ypma ,  Dimitra Gkorou ,  Reza Sahraeian

IPC: G03F7/20 ,  G03F7/00

CPC classification number: G03F7/70525

Abstract: A method for determining an inspection strategy for at least one substrate, the method including: quantifying, using a prediction model, a compliance metric value for a compliance metric relating to a prediction of compliance with a quality requirement based on one or both of pre-processing data associated with the substrate and any available post-processing data associated with the at least one substrate; and deciding on an inspection strategy for the at least one substrate, based on the compliance metric value, an expected cost associated with the inspection strategy and at least one objective value describing an expected value of the inspection strategy in terms of at least one objective relating to the prediction model.

公开(公告)号：US11150562B2

公开(公告)日：2021-10-19

申请号：US16486859

申请日：2018-02-22

Applicant: ASML NETHERLANDS B.V.

Inventor： Jelle Nije ,  Alexander Ypma ,  Dimitra Gkorou ,  Georgios Tsirogiannis ,  Robert Jan Van Wijk ,  Tzu-Chao Chen ,  Frans Reinier Spiering ,  Sarathi Roy ,  Cédric Désiré Grouwstra

IPC: G03F7/20

Abstract: A method of optimizing an apparatus for multi-stage processing of product units such as wafers, the method includes: receiving object data representing one or more parameters measured across the product units and associated with different stages of processing of the product units; and determining fingerprints of variation of the object data across the product units, the fingerprints being associated with different respective stages of processing of the product units. The fingerprints may be determined by decomposing the object data into components using principal component analysis for each different respective stage; analyzing commonality of the fingerprints through the different stages to produce commonality results; and optimizing an apparatus for processing product units based on the commonality results.

公开(公告)号：US11579534B2

公开(公告)日：2023-02-14

申请号：US17436113

申请日：2020-02-06

Applicant: ASML NETHERLANDS B.V.

Inventor： Maialen Larranaga ,  Dimitra Gkorou ,  Faegheh Hasibi ,  Alexander Ypma

IPC: G03F7/20 ,  G06N20/00

Abstract: A method of extracting a feature from a data set includes iteratively extracting a feature from a data set based on a visualization of a residual pattern within the data set, wherein the feature is distinct from a feature extracted in a previous iteration, and the visualization of the residual pattern uses the feature extracted in the previous iteration. Visualizing the data set using the feature extracted in the previous iteration may include showing residual patterns of attribute data that are relevant to target data. Visualizing the data set using the feature extracted in the previous iteration may involve adding cluster constraints to the data set, based on the feature extracted in the previous iteration. Additionally or alternatively, visualizing the data set using the feature extracted in the previous iteration may involve defining conditional probabilities conditioned on the feature extracted in the previous iteration.

公开(公告)号：US11520238B2

公开(公告)日：2022-12-06

申请号：US17479078

申请日：2021-09-20

Applicant: ASML NETHERLANDS B.V.

Inventor： Jelle Nije ,  Alexander Ypma ,  Dimitra Gkorou ,  Georgios Tsirogiannis ,  Robert Jan Van Wijk ,  Tzu-Chao Chen ,  Frans Reinier Spiering ,  Sarathi Roy ,  Cédric Désiré Grouwstra

IPC: G03F7/20

Abstract: A method of optimizing an apparatus for multi-stage processing of product units such as wafers, the method includes: receiving object data representing one or more parameters measured across the product units and associated with different stages of processing of the product units; and determining fingerprints of variation of the object data across the product units, the fingerprints being associated with different respective stages of processing of the product units. The fingerprints may be determined by decomposing the object data into components using principal component analysis for each different respective stage; analyzing commonality of the fingerprints through the different stages to produce commonality results; and optimizing an apparatus for processing product units based on the commonality results.