- Patent Title: Apparatus and method for generating an electromagnetic radiation
-
Application No.: US16713964Application Date: 2019-12-13
-
Publication No.: US11199767B2Publication Date: 2021-12-14
- Inventor: Chung-Chieh Lee , Feng Yuan Hsu , Chyi Shyuan Chern , Chi-Ming Yang , Tsiao-Chen Wu , Chun-Lin Chang
- Applicant: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY LTD.
- Applicant Address: TW Hsinchu
- Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY LTD.
- Current Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY LTD.
- Current Assignee Address: TW Hsinchu
- Agency: WPAT, P.C., Intellectual Property Attorneys
- Agent Anthony King
- Main IPC: G03F1/24
- IPC: G03F1/24 ; G03F1/52 ; G03F7/20

Abstract:
A method for generating an electromagnetic radiation includes the following operations. A target material is introduced in a chamber. A light beam is irradiated on the target material in the chamber to generate plasma and an electromagnetic radiation. The electromagnetic radiation is collected with an optical device. A gas mixture is introduced in the chamber. The gas mixture includes a first buffer gas reactive to the target material, and a second buffer gas to slow down debris of the target material and/or plasma by-product, so as to increase an reaction efficiency of the target material and the first buffer gas, and to reduce deposition of the debris of the target material and/or the plasma by-product on the optical device.
Information query