Invention Grant
- Patent Title: Method and composition for selectively modifying base material surface
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Application No.: US16288385Application Date: 2019-02-28
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Publication No.: US11211246B2Publication Date: 2021-12-28
- Inventor: Hiroyuki Komatsu , Tomohiro Oda , Hitoshi Osaki , Masafumi Hori , Takehiko Naruoka
- Applicant: JSR CORPORATION
- Applicant Address: JP Tokyo
- Assignee: JSR CORPORATION
- Current Assignee: JSR CORPORATION
- Current Assignee Address: JP Tokyo
- Agency: Oblon, McClelland, Maier & Neustadt, L.L.P.
- Priority: JPJP2016-171341 20160901
- Main IPC: H01L21/027
- IPC: H01L21/027 ; B05D3/02 ; B05D7/14 ; C09D1/00 ; H01L21/321 ; H01L21/02 ; B05D3/14 ; C09D7/61 ; C08F112/08 ; B05D1/32 ; B05D3/10 ; C08F8/00 ; H01L21/768 ; C09D7/20 ; C09D5/00 ; C09D125/06 ; C09D125/16 ; C09D133/12 ; C09D183/04 ; C23C16/02 ; H01L21/311 ; C08F120/14 ; B05D1/00

Abstract:
A method for selectively modifying a base material surface, includes applying a composition on a surface of a base material to form a coating film. The coating film is heated. The base material includes a surface layer which includes a first region including silicon. The composition includes a first polymer and a solvent. The first polymer includes at an end of a main chain or a side chain thereof, a group including a first functional group capable of forming a bond with the silicon. The first region preferably contains a silicon oxide, a silicon nitride, or a silicon oxynitride. The base material preferably further includes a second region that is other than the first region and that contains a metal; and the method preferably further includes, after the heating, removing with a rinse agent a portion formed on the second region, of the coating film.
Public/Granted literature
- US20190198317A1 METHOD AND COMPOSITION FOR SELECTIVELY MODIFYING BASE MATERIAL SURFACE Public/Granted day:2019-06-27
Information query
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