公开(公告)号：US11211246B2

公开(公告)日：2021-12-28

申请号：US16288385

申请日：2019-02-28

申请人： JSR CORPORATION

发明人： Hiroyuki Komatsu ,  Tomohiro Oda ,  Hitoshi Osaki ,  Masafumi Hori ,  Takehiko Naruoka

IPC分类号： H01L21/027 ,  B05D3/02 ,  B05D7/14 ,  C09D1/00 ,  H01L21/321 ,  H01L21/02 ,  B05D3/14 ,  C09D7/61 ,  C08F112/08 ,  B05D1/32 ,  B05D3/10 ,  C08F8/00 ,  H01L21/768 ,  C09D7/20 ,  C09D5/00 ,  C09D125/06 ,  C09D125/16 ,  C09D133/12 ,  C09D183/04 ,  C23C16/02 ,  H01L21/311 ,  C08F120/14 ,  B05D1/00

摘要： A method for selectively modifying a base material surface, includes applying a composition on a surface of a base material to form a coating film. The coating film is heated. The base material includes a surface layer which includes a first region including silicon. The composition includes a first polymer and a solvent. The first polymer includes at an end of a main chain or a side chain thereof, a group including a first functional group capable of forming a bond with the silicon. The first region preferably contains a silicon oxide, a silicon nitride, or a silicon oxynitride. The base material preferably further includes a second region that is other than the first region and that contains a metal; and the method preferably further includes, after the heating, removing with a rinse agent a portion formed on the second region, of the coating film.

公开(公告)号：US20180342387A1

公开(公告)日：2018-11-29

申请号：US16057017

申请日：2018-08-07

申请人： JSR CORPORATION

发明人： Hiroyuki Komatsu ,  Tomohiro Oda ,  Masafumi Hori ,  Takehiko Naruoka ,  Tomoki Nagai

IPC分类号： H01L21/027 ,  G03F7/16 ,  C08F12/08 ,  C08F20/14 ,  G03F7/038 ,  G03F7/039 ,  G03F7/20 ,  G03F7/32 ,  H01L21/768

摘要： A pattern-forming method includes: forming a pattern on an upper face side of a substrate; applying a first composition to a sidewall of the pattern; forming a resin layer by applying a second composition to an inner face side of the sidewall of the pattern coated with the first composition; allowing the resin layer to separate into a plurality of phases; and removing at least one of the plurality of phases. The first composition contains a first polymer. The second composition contains a second polymer. The second polymer includes a first block having a first structural unit and a second block having a second structural unit. The polarity of the second structural unit is higher than the polarity of the first structural unit. Immediately before forming of the resin layer, a static contact angle θ (°) of water on the sidewall of the pattern satisfies inequality (1). α ≥ θ ≥ α + β 2 ( 1 )

公开(公告)号：US11705331B2

公开(公告)日：2023-07-18

申请号：US17148729

申请日：2021-01-14

申请人： JSR CORPORATION

发明人： Hiroyuki Komatsu ,  Tomohiro Oda ,  Hitoshi Osaki ,  Masafumi Hori ,  Takehiko Naruoka

IPC分类号： H01L21/027 ,  C08F112/08 ,  C09D125/06 ,  H01L21/28 ,  H01L21/321 ,  H01L21/285 ,  C08F8/00 ,  H01L21/02 ,  H01L21/311 ,  C08F120/14 ,  C08L25/06 ,  C08L33/10

CPC分类号： H01L21/0271 ,  C08F8/00 ,  C08F112/08 ,  C09D125/06 ,  H01L21/02118 ,  H01L21/02282 ,  H01L21/02334 ,  H01L21/02359 ,  H01L21/28 ,  H01L21/285 ,  H01L21/31133 ,  H01L21/321 ,  C08F120/14 ,  C08F2810/40 ,  C08L25/06 ,  C08L33/10 ,  C08L2203/206 ,  C08L2312/02 ,  C08F8/00 ,  C08F120/14 ,  C08F8/00 ,  C08F112/08

摘要： A composition for use in selective modification of a base material surface includes a polymer having, at an end of a main chain or a side chain thereof, a group including a first functional group capable of forming a bond with a metal, and a solvent.

公开(公告)号：US11370872B2

公开(公告)日：2022-06-28

申请号：US16240070

申请日：2019-01-04

申请人： JSR CORPORATION

发明人： Masafumi Hori ,  Hiroyuki Komatsu ,  Tomohiro Oda ,  Hitoshi Osaki ,  Takehiko Naruoka

IPC分类号： C08F297/02 ,  G03F7/32 ,  C08K5/10 ,  C08L53/00 ,  B82Y40/00 ,  B82Y30/00 ,  H01L21/027 ,  G03F7/00 ,  C08L25/04

摘要： A composition for pattern formation includes a first polymer, a second polymer and a solvent. The first polymer includes: a first block including a first structural unit derived from a substituted or unsubstituted styrene; and a second block including a second structural unit other than the first structural unit. The second polymer includes: the first structural unit; and a group bonding to at least one end of a main chain thereof and including a polar group. The polar group is preferably a hydroxy group or a carboxyl group. A number average molecular weight of the second polymer is preferably no greater than 6,000. A mass ratio of the second polymer to the first polymer is preferably no less than 0.15 and no greater than 0.4. The solvent preferably comprises a compound comprising a hydroxyl group and an alkyl ester group.

公开(公告)号：US10950438B2

公开(公告)日：2021-03-16

申请号：US16288354

申请日：2019-02-28

申请人： JSR CORPORATION

发明人： Hiroyuki Komatsu ,  Tomohiro Oda ,  Hitoshi Osaki ,  Masafumi Hori ,  Takehiko Naruoka

IPC分类号： H01L21/027 ,  C08F112/08 ,  C09D125/06 ,  H01L21/28 ,  H01L21/321 ,  H01L21/285 ,  C08F8/00 ,  H01L21/02 ,  H01L21/311 ,  C08F120/14 ,  C08L25/06 ,  C08L33/10

摘要： A method for selectively modifying a base material surface, includes applying a composition on a surface of a base material to form a coating film. The coating film is heated. The base material includes a surface layer which includes a first region including a metal. The composition includes a first polymer and a solvent. The first polymer includes at an end of a main chain or a side chain thereof, a group including a first functional group capable of forming a bond with the metal. It is preferred that the base material further includes a second region comprising substantially only a non-metal, and the method further includes, after the heating, removing with a rinse agent a portion formed on the second region, of the coating film. The metal is preferably a constituent of a metal substance, an alloy, an oxide, an electrically conductive nitride or a silicide.

公开(公告)号：US20190135967A1

公开(公告)日：2019-05-09

申请号：US16240070

申请日：2019-01-04

申请人： JSR Corporation

发明人： Masafumi HORI ,  Hiroyuki Komatsu ,  Tomohiro Oda ,  Hitoshi Osaki ,  Takehiko Naruoka

IPC分类号： C08F297/02 ,  C08K5/10 ,  C08L25/04 ,  H01L21/027 ,  C08L53/00

摘要： A composition for pattern formation includes a first polymer, a second polymer and a solvent. The first polymer includes: a first block including a first structural unit derived from a substituted or unsubstituted styrene; and a second block including a second structural unit other than the first structural unit. The second polymer includes: the first structural unit; and a group bonding to at least one end of a main chain thereof and including a polar group. The polar group is preferably a hydroxy group or a carboxyl group. A number average molecular weight of the second polymer is preferably no greater than 6,000. A mass ratio of the second polymer to the first polymer is preferably no less than 0.15 and no greater than 0.4. The solvent preferably comprises a compound comprising a hydroxyl group and an alkyl ester group.

公开(公告)号：US11335559B2

公开(公告)日：2022-05-17

申请号：US16940589

申请日：2020-07-28

申请人： JSR CORPORATION

发明人： Hiroyuki Komatsu ,  Tomohiro Oda ,  Masafumi Hori ,  Takehiko Naruoka ,  Tomoki Nagai

IPC分类号： H01L21/027 ,  H01L21/308 ,  H01L21/3065 ,  H01L21/768 ,  C08L53/00 ,  C08F212/08 ,  C08F293/00 ,  C08F12/08 ,  C08F20/14 ,  G03F7/038 ,  G03F7/039 ,  G03F7/16 ,  G03F7/20 ,  G03F7/32

摘要： A pattern-forming method includes: forming a pattern on an upper face side of a substrate; applying a first composition to a sidewall of the pattern; forming a resin layer by applying a second composition to an inner face side of the sidewall of the pattern coated with the first composition; allowing the resin layer to separate into a plurality of phases; and removing at least one of the plurality of phases. The first composition contains a first polymer. The second composition contains a second polymer. The second polymer includes a first block having a first structural unit and a second block having a second structural unit. The polarity of the second structural unit is higher than the polarity of the first structural unit. Immediately before forming of the resin layer, a static contact angle θ (°) of water on the sidewall of the pattern satisfies inequality (1). α ≥ θ ≥ α + β 2 ( 1 )

公开(公告)号：US20190235386A1

公开(公告)日：2019-08-01

申请号：US16376385

申请日：2019-04-05

申请人： JSR Corporation

发明人： Hiroyuki Komatsu ,  Takehiko Naruoka ,  Masafumi Hori ,  Hitoshi Osaki ,  Tomohiro Oda

IPC分类号： G03F7/11 ,  H01L21/308 ,  H01L21/027 ,  G03F7/16 ,  G03F7/20 ,  G03F7/32 ,  C08F112/08 ,  C08F212/08

摘要： A pattern-forming method includes forming a base pattern having recessed portions on a front face side of a substrate directly or via other layer. The recessed portions of the base pattern are filled with a first composition to form a filler layer. Phase separation of the filler layer is allowed to form a plurality of phases of the filler layer. A part of the plurality of phases of the filler layer is removed to form a miniaturized pattern. The forming of the base pattern includes: forming a resist pattern on the front face side of the substrate; forming a layer of a second polymer on lateral faces of the resist pattern; and forming a layer of a third polymer that differs from the second polymer on a surface of the substrate or on a surface of the other layer.

公开(公告)号：US20190198317A1

公开(公告)日：2019-06-27

申请号：US16288385

申请日：2019-02-28

申请人： JSR CORPORATION

发明人： Hiroyuki KOMATSU ,  Tomohiro Oda ,  Hitoshi Osaki ,  Masafumi Hori ,  Takehiko Naruoka

IPC分类号： H01L21/027 ,  C23C16/02 ,  H01L21/02 ,  H01L21/311 ,  C09D5/00 ,  C09D125/06 ,  C09D183/04 ,  C09D125/16 ,  C09D133/12 ,  C09D7/20

CPC分类号： H01L21/0271 ,  B05D3/02 ,  B05D7/00 ,  C09D5/008 ,  C09D7/20 ,  C09D125/06 ,  C09D125/16 ,  C09D133/12 ,  C09D183/04 ,  C23C16/0227 ,  H01L21/02118 ,  H01L21/02271 ,  H01L21/02282 ,  H01L21/02334 ,  H01L21/02359 ,  H01L21/3065 ,  H01L21/31133

摘要： A method for selectively modifying a base material surface, includes applying a composition on a surface of a base material to form a coating film. The coating film is heated. The base material includes a surface layer which includes a first region including silicon. The composition includes a first polymer and a solvent. The first polymer includes at an end of a main chain or a side chain thereof, a group including a first functional group capable of forming a bond with the silicon. The first region preferably contains a silicon oxide, a silicon nitride, or a silicon oxynitride. The base material preferably further includes a second region that is other than the first region and that contains a metal; and the method preferably further includes, after the heating, removing with a rinse agent a portion formed on the second region, of the coating film.

公开(公告)号：US20190233561A1

公开(公告)日：2019-08-01

申请号：US16239592

申请日：2019-01-04

申请人： JSR CORPORATION

发明人： Hiroyuki KOMATSU ,  Tomohiro Oda ,  Hitoshi Osaki ,  Masafumi Hori ,  Takehiko Naruoka

IPC分类号： C08F220/12 ,  C09D201/02 ,  H01L21/027 ,  C09D153/00 ,  G03F7/00

CPC分类号： C08F220/12 ,  C09D153/00 ,  C09D201/02 ,  G03F7/0002 ,  H01L21/027 ,  H01L21/3065

摘要： A composition for film formation includes a polymer and a solvent. The polymer includes a first repeating unit, a second repeating unit, a third repeating unit, and a structural unit on at least one end of a main chain of the polymer. The first repeating unit includes a crosslinkable group. The second repeating unit differs from the first repeating unit. The third repeating unit differs from the first repeating unit and has higher polarity than polarity of the second repeating unit. The structural unit includes an interacting group capable of interacting with Si—OH, Si—H or Si—N.