Invention Grant
- Patent Title: Apparatus and method for monitoring the relative relationship between the wafer and the chuck
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Application No.: US17017099Application Date: 2020-09-10
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Publication No.: US11349414B2Publication Date: 2022-05-31
- Inventor: Te-Min Wang , Yu-Ho Ni , Chun-Chieh Lin , Chien-Chung Hou , Cheng-Mao Chien
- Applicant: Advanced Ion Beam Technology, Inc.
- Applicant Address: TW Hsin-Chu
- Assignee: Advanced Ion Beam Technology, Inc.
- Current Assignee: Advanced Ion Beam Technology, Inc.
- Current Assignee Address: TW Hsin-Chu
- Agency: WPAT, PC
- Priority: TW105135806 20161104
- Main IPC: H02N13/00
- IPC: H02N13/00 ; H01L21/687 ; H01L21/67 ; H01L21/683 ; G01R31/28 ; G01R27/26 ; H05F3/02

Abstract:
An apparatus and a method for monitoring the relative relationship between the wafer and the chuck is provided, especially for monitoring whether the wafer is sticky on the chuck when the wafer is de-chucked. The lift pins may be extended outside the chuck to separate the wafer and the chuck when the wafer is de-chucked. By detecting the capacitance between the de-chucked wafer and the chuck, especially by comparing the detected capacitance with the capacitance that the wafer is held by the chuck, one may determine whether the wafer is sticky on the chuck, or even whether the wafer is properly supported by the lift pins. Accordingly, an early alarm may be issued if the wafer is sticky or improperly removed. Besides, by controlling a switch electrically connected to a lift pin that contacted the wafer, the charges at the wafer may be eliminated.
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