Invention Grant
- Patent Title: Mask structure and manufacturing method thereof
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Application No.: US16395244Application Date: 2019-04-26
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Publication No.: US11366381B2Publication Date: 2022-06-21
- Inventor: Pu-Ju Lin , Shih-Lian Cheng , Yu-Hua Chen , Cheng-Ta Ko , Jui-Jung Chien , Wei-Tse Ho
- Applicant: Unimicron Technology Corp.
- Applicant Address: TW Taoyuan
- Assignee: Unimicron Technology Corp.
- Current Assignee: Unimicron Technology Corp.
- Current Assignee Address: TW Taoyuan
- Agency: JCIPRNET
- Main IPC: B32B37/00
- IPC: B32B37/00 ; G03F1/50 ; H05K3/06 ; H05K3/24 ; H05K3/00 ; H05K3/10 ; H05K3/12 ; H05K3/18 ; H05K3/42 ; G03F7/20 ; G01K7/24 ; G01K15/00

Abstract:
A mask structure and a manufacturing method of the mask structure are provided. The mask structure includes a transparent substrate, a patterned metal layer, and a plurality of microlens structures. The patterned metal layer is disposed on the transparent substrate and exposing a portion of the transparent substrate. The microlens structures are disposed on the transparent substrate exposed by a portion of the patterned metal layer and being in contact with the portion of the patterned metal layer.
Public/Granted literature
- US20190250502A1 MASK STRUCTURE AND MANUFACTURING METHOD THEREOF Public/Granted day:2019-08-15
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