Invention Grant
- Patent Title: Method for evaluating control strategies in a semiconductor manufacturing process
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Application No.: US16979056Application Date: 2019-02-13
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Publication No.: US11372338B2Publication Date: 2022-06-28
- Inventor: Ivo Matteo Leonardus Weijden , Jeroen Van Dongen , Cornelis Johannes Henricus Lambregts , Theo Wilhelmus Maria Thijssen , Ruud Rudolphus Johannes Catharinus De Wit , Hans Marinus Struijs , Erik Mathijs Maria Crombag , Roy Werkman , Maria Helena Schut , Erwin Riemens , Menno Meeldijk
- Applicant: ASML NETHERLANDS B.V.
- Applicant Address: NL Veldhoven
- Assignee: ASML NETHERLANDS B.V.
- Current Assignee: ASML NETHERLANDS B.V.
- Current Assignee Address: NL Veldhoven
- Agency: Pillsbury Winthrop Shaw Pittman LLP
- Priority: EP18165064 20180329,EP18197856 20181001
- International Application: PCT/EP2019/053535 WO 20190213
- International Announcement: WO2019/185233 WO 20191003
- Main IPC: G03F7/20
- IPC: G03F7/20 ; G01N21/95 ; G03F9/00 ; H01L21/66

Abstract:
A method for determining a preferred control strategy relating to control of a manufacturing process for manufacturing an integrated circuit. The method includes: obtaining process data associated with a design of said integrated circuit; and obtaining a plurality of candidate control strategies configured to control the manufacturing process based on the process data, each candidate control strategy including an associated cost metric based on an associated requirement to implement the candidate control strategy. A quality metric related to an expected performance of the manufacturing process is determined for each candidate control strategies, and a preferred control strategy is selected based on the determined quality metrics and associated cost metrics for each candidate control strategy.
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