公开(公告)号：US11662666B2

公开(公告)日：2023-05-30

申请号：US17441353

申请日：2020-03-05

Applicant: ASML NETHERLANDS B.V.

Inventor： Rowin Meijerink ,  Putra Saputra ,  Pieter Gerardus Jacobus Smorenberg ,  Theo Wilhelmus Maria Thijssen ,  Khalid Elbattay ,  Ma Su Su Hlaing ,  Paul Derwin ,  Bo Zhong ,  Masaya Komatsu

IPC: G03F7/20

CPC classification number: G03F7/70633 ,  G03F7/70258 ,  G03F7/70725

Abstract: A method for controlling a lithographic apparatus configured to pattern an exposure field on a substrate including at least a sub-field, the method including: obtaining an initial spatial profile associated with a spatial variation of a performance parameter associated with a layer on the substrate across at least the sub-field of the exposure field; and decomposing the initial spatial profile into at least a first component spatial profile for controlling a lithographic apparatus at a first spatial scale and a second component spatial profile for controlling the lithographic apparatus at a second spatial scale associated with a size of the sub-field, wherein the decomposing includes co-optimizing the first and second component spatial profiles based on correcting the spatial variation of the performance parameter across the sub-field.

公开(公告)号：US11372338B2

公开(公告)日：2022-06-28

申请号：US16979056

申请日：2019-02-13

Applicant: ASML NETHERLANDS B.V.

Inventor： Ivo Matteo Leonardus Weijden ,  Jeroen Van Dongen ,  Cornelis Johannes Henricus Lambregts ,  Theo Wilhelmus Maria Thijssen ,  Ruud Rudolphus Johannes Catharinus De Wit ,  Hans Marinus Struijs ,  Erik Mathijs Maria Crombag ,  Roy Werkman ,  Maria Helena Schut ,  Erwin Riemens ,  Menno Meeldijk

IPC: G03F7/20 ,  G01N21/95 ,  G03F9/00 ,  H01L21/66

Abstract: A method for determining a preferred control strategy relating to control of a manufacturing process for manufacturing an integrated circuit. The method includes: obtaining process data associated with a design of said integrated circuit; and obtaining a plurality of candidate control strategies configured to control the manufacturing process based on the process data, each candidate control strategy including an associated cost metric based on an associated requirement to implement the candidate control strategy. A quality metric related to an expected performance of the manufacturing process is determined for each candidate control strategies, and a preferred control strategy is selected based on the determined quality metrics and associated cost metrics for each candidate control strategy.