- Patent Title: Method for producing group III nitride crystal and seed substrate
-
Application No.: US16792386Application Date: 2020-02-17
-
Publication No.: US11377757B2Publication Date: 2022-07-05
- Inventor: Yoshio Okayama , Shinsuke Komatsu , Masahiro Tada , Yusuke Mori , Masayuki Imanishi , Masashi Yoshimura
- Applicant: PANASONIC CORPORATION , OSAKA UNIVERSITY
- Applicant Address: JP Osaka; JP Osaka
- Assignee: PANASONIC CORPORATION,OSAKA UNIVERSITY
- Current Assignee: PANASONIC CORPORATION,OSAKA UNIVERSITY
- Current Assignee Address: JP Osaka; JP Osaka
- Agency: Pearne & Gordon LLP
- Priority: JPJP2019-028247 20190220
- Main IPC: C30B29/40
- IPC: C30B29/40 ; C30B15/36 ; C30B15/00 ; C30B19/02 ; C30B25/18

Abstract:
An object of the present invention is to provide a method for producing a group III nitride crystal in which generation of breaking or cracks is less likely to occur. To achieve the object, the method for producing a group III nitride crystal includes: seed crystal preparation including disposing a plurality of crystals of a group III nitride as a plurality of seed crystals on a substrate; and crystal growth including growing group III nitride crystals by contacting a surface of each of the seed crystals with a melt containing at least one group III element selected from gallium, aluminum, and indium and an alkali metal in an atmosphere containing nitrogen. In the seed crystal preparation, the plurality of seed crystals are disposed within a hexagonal region provided on the substrate.
Public/Granted literature
- US20200263320A1 METHOD FOR PRODUCING GROUP III NITRIDE CRYSTAL AND SEED SUBSTRATE Public/Granted day:2020-08-20
Information query
IPC分类: