发明授权
- 专利标题： Dual additive composition for polishing memory hard disks exhibiting edge roll off
-
申请号： US16729905申请日： 2019-12-30
-
公开(公告)号： US11384253B2公开(公告)日： 2022-07-12
- 发明人: Tong Li
- 申请人： Cabot Microelectronics Corporation
- 申请人地址： US IL Aurora
- 专利权人： Cabot Microelectronics Corporation
- 当前专利权人： Cabot Microelectronics Corporation
- 当前专利权人地址： US IL Aurora
- 代理商 Thomas Omholt; Erika R. Singleton
- 主分类号： C09G1/02
- IPC分类号： C09G1/02 ; H01L21/321 ; C09K13/00 ; H01L21/306 ; C23F1/30 ; G11B5/84 ; C23F3/06
摘要：
The invention provides a chemical-mechanical polishing composition comprising (a) an abrasive comprising colloidal silica, (b) a compound of formula (I), (c) a compound of formula (II), (d) hydrogen peroxide, and (e) water, wherein the polishing composition has a pH of about 1 to about 5. The invention also provides a method of chemically-mechanically polishing a substrate, especially a nickel-phosphorous substrate, by contacting the substrate with the inventive chemical-mechanical polishing composition.
公开/授权文献
信息查询
