Invention Grant
- Patent Title: Polishing slurry, method for polishing glass, and method for manufacturing glass
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Application No.: US17324921Application Date: 2021-05-19
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Publication No.: US11518912B2Publication Date: 2022-12-06
- Inventor: Tomohiro Shibuya
- Applicant: AGC Inc.
- Applicant Address: JP Tokyo
- Assignee: AGC Inc.
- Current Assignee: AGC Inc.
- Current Assignee Address: JP Tokyo
- Agency: Foley & Lardner LLP
- Main IPC: C09G1/04
- IPC: C09G1/04 ; C03C15/02 ; C09G1/14 ; H01L21/306 ; C09K3/14 ; H01L21/321 ; C09G1/00 ; C09K13/06 ; C09G1/06 ; B82Y30/00
Abstract:
Smoothness of glass is improved. A polishing slurry (A) contains amorphous carbon and water, and a total amount of the amorphous carbon and the water is equal to or more than 90% of the whole polishing slurry in terms of mass ratio.
Public/Granted literature
- US20210269676A1 POLISHING SLURRY, METHOD FOR POLISHING GLASS, AND METHOD FOR MANUFACTURING GLASS Public/Granted day:2021-09-02
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