Invention Grant
- Patent Title: Multi-zone plasma-enhanced chemical vapor deposition apparatus and methods for operating the same
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Application No.: US16867818Application Date: 2020-05-06
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Publication No.: US11538708B2Publication Date: 2022-12-27
- Inventor: Shoichi Murakami , Shigeru Nakatsuka , Syo Fukata , Yusuke Osawa , Shigehiro Fujino , Masaaki Higashitani
- Applicant: SANDISK TECHNOLOGIES LLC
- Applicant Address: US TX Addison
- Assignee: SANDISK TECHNOLOGIES LLC
- Current Assignee: SANDISK TECHNOLOGIES LLC
- Current Assignee Address: US TX Addison
- Agency: The Marbury Law Group PLLC
- Main IPC: H01L21/683
- IPC: H01L21/683 ; H01L21/67 ; H01J37/32 ; H01L21/687

Abstract:
An apparatus includes an electrostatic chuck and located within a vacuum enclosure. A plurality of conductive plates can be embedded in the electrostatic chuck, and a plurality of plate bias circuits can be configured to independently electrically bias a respective one of the plurality of conductive plates. Alternatively or additionally, a plurality of spot lamp zones including a respective set of spot lamps can be provided between a bottom portion of the vacuum enclosure and a backside surface of the electrostatic chuck. The plurality of conductive plates and/or the plurality of spot lamp zones can be employed to locally modify chucking force and to provide local temperature control.
Public/Granted literature
- US20210351058A1 MULTI-ZONE PLASMA-ENHANCED CHEMICAL VAPOR DEPOSITION APPARATUS AND METHODS FOR OPERATING THE SAME Public/Granted day:2021-11-11
Information query
IPC分类: