Invention Grant
- Patent Title: Spin orbit memory devices with reduced magnetic moment and methods of fabrication
-
Application No.: US16367133Application Date: 2019-03-27
-
Publication No.: US11557629B2Publication Date: 2023-01-17
- Inventor: Kaan Oguz , Christopher Wiegand , Noriyuki Sato , Angeline Smith , Tanay Gosavi
- Applicant: Intel Corporation
- Applicant Address: US CA Santa Clara
- Assignee: Intel Corporation
- Current Assignee: Intel Corporation
- Current Assignee Address: US CA Santa Clara
- Agency: Essential Patents Group, LLP
- Main IPC: H01L27/22
- IPC: H01L27/22 ; H01L43/14 ; H01L43/10 ; H01L43/06 ; H01L43/08 ; H01L43/04

Abstract:
A spin orbit memory device includes a material layer stack on a spin orbit electrode. The material layer stack includes a magnetic tunnel junction (MTJ) and a synthetic antiferromagnetic (SAF) structure on the MTJ. The SAF structure includes a first magnet structure and a second magnet structure separated by an antiferromagnetic coupling layer. The first magnet structure includes a first magnet and a second magnet separated by a single layer of a non-magnetic material such as platinum. The second magnet structure includes a stack of bilayers, where each bilayer includes a layer of platinum on a layer of a magnetic material such.
Public/Granted literature
- US20200312908A1 SPIN ORBIT MEMORY DEVICES WITH REDUCED MAGNETIC MOMENT AND METHODS OF FABRICATION Public/Granted day:2020-10-01
Information query
IPC分类: