Invention Grant
- Patent Title: Ion beam sputtering with ion assisted deposition for coatings on chamber components
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Application No.: US15844251Application Date: 2017-12-15
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Publication No.: US11566319B2Publication Date: 2023-01-31
- Inventor: Jennifer Y. Sun , Vahid Firouzdor , Biraja Prasad Kanungo , Tom K. Cho , Vedapuram S. Achutharaman , Ying Zhang
- Applicant: Applied Materials, Inc.
- Applicant Address: US CA Santa Clara
- Assignee: Applied Materials, Inc.
- Current Assignee: Applied Materials, Inc.
- Current Assignee Address: US CA Santa Clara
- Agency: Lowenstein Sandler LLP
- Main IPC: C04B41/89
- IPC: C04B41/89 ; C04B41/00 ; C04B41/52 ; C04B35/505 ; C04B35/622 ; C04B41/45 ; C04B35/00 ; C23C14/08 ; C04B41/50 ; C23C14/46 ; C23C14/58 ; H01J37/32 ; C04B41/87
Abstract:
An article comprises a body and a conformal protective layer on at least one surface of the body. The conformal protective layer is a plasma resistant rare earth oxide film having a thickness of less than 1000 μm, wherein the plasma resistant rare earth oxide film consists essentially of 40 mol % to less than 100 mol % of Y2O3, over 0 mol % to 60 mol % of ZrO2, and 0 mol % to 9 mol % of Al2O3.
Public/Granted literature
- US20180105922A1 ION BEAM SPUTTERING WITH ION ASSISTED DEPOSITION FOR COATINGS ON CHAMBER COMPONENTS Public/Granted day:2018-04-19
Information query
