- Patent Title: Vertical-cavity surface-emitting laser fabrication on large wafer
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Application No.: US16841824Application Date: 2020-04-07
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Publication No.: US11588299B2Publication Date: 2023-02-21
- Inventor: Vladimir Iakovlev , Yuri Berk , Elad Mentovich , Tamir Sharkaz
- Applicant: Mellanox Technologies, Ltd.
- Applicant Address: IL Yokneam
- Assignee: Mellanox Technologies, Ltd.
- Current Assignee: Mellanox Technologies, Ltd.
- Current Assignee Address: IL Yokneam
- Agency: Alston & Bird LLP
- Main IPC: H01S5/18
- IPC: H01S5/18 ; H01S5/183 ; H01S5/042 ; H01S5/30 ; H01S5/00 ; H01S5/20 ; H01S5/02 ; H01S5/343 ; H01L21/18 ; H01L21/02 ; H01L21/306 ; H01L21/283 ; H01L21/32

Abstract:
Methods for fabricating vertical cavity surface emitting lasers (VCSELs) on a large wafer are provided. An un-patterned epi layer form is bonded onto a first reflector form. The first reflector form includes a first reflector layer and a wafer of a first substrate type. The un-patterned epi layer form includes a plurality of un-patterned layers on a wafer of a second substrate type. The first and second substrate types have different thermal expansion coefficients. A resulting bonded blank is substantially non-varying in a plane that is normal to an intended emission direction of the VCSEL. A first regrowth is performed to form first regrowth layers, some of which are patterned to form a tunnel junction pattern. A second regrowth is performed to form second regrowth layers. A second reflector form is bonded onto the second regrowth layers, wherein the second reflector form includes a second reflector layer.
Public/Granted literature
- US20210313770A1 VERTICAL-CAVITY SURFACE-EMITTING LASER FABRICATION ON LARGE WAFER Public/Granted day:2021-10-07
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