Invention Grant
- Patent Title: Power device with graded channel
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Application No.: US16675813Application Date: 2019-11-06
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Publication No.: US11605732B2Publication Date: 2023-03-14
- Inventor: Kevin Kyuheon Cho , Bongyong Lee , Kyeongseok Park , Doojin Choi , Thomas Neyer , James Joseph Victory
- Applicant: SEMICONDUCTOR COMPONENTS INDUSTRIES, LLC
- Applicant Address: US AZ Phoenix
- Assignee: SEMICONDUCTOR COMPONENTS INDUSTRIES, LLC
- Current Assignee: SEMICONDUCTOR COMPONENTS INDUSTRIES, LLC
- Current Assignee Address: US AZ Phoenix
- Agency: Brake Hughes Bellermann LLP
- Main IPC: H01L29/78
- IPC: H01L29/78 ; H01L21/04 ; H01L29/66 ; H01L29/16

Abstract:
A power device includes a silicon carbide substrate. A gate is provided on a first side of the silicon carbide substrate. A graded channel includes a first region having a first dopant concentration and a second region having a second dopant concentration, the second dopant concentration being greater than the first dopant concentration.
Public/Granted literature
- US20210134997A1 POWER DEVICE WITH GRADED CHANNEL Public/Granted day:2021-05-06
Information query
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