- 专利标题： Methods of tuning process models
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申请号： US16478489申请日： 2018-01-24
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公开(公告)号： US11614690B2公开(公告)日： 2023-03-28
- 发明人: Mu Feng , Mir Farrokh Shayegan Salek , Dianwen Zhu , Leiwu Zheng , Rafael C. Howell , Jen-Shiang Wang
- 申请人： ASML NETHERLANDS B.V.
- 申请人地址： NL Veldhoven
- 专利权人： ASML NETHERLANDS B.V.
- 当前专利权人： ASML NETHERLANDS B.V.
- 当前专利权人地址： NL Veldhoven
- 代理机构： Pillsbury Winthrop Shaw Pittman LLP
- 国际申请： PCT/EP2018/051669 WO 20180124
- 国际公布： WO2018/138123 WO 20180802
- 主分类号： G05B19/418
- IPC分类号： G05B19/418 ; G03F7/20
摘要：
Methods of constructing a process model for simulating a characteristic of a product of lithography from patterns produced under different processing conditions. The methods use a deviation between the variation of the simulated characteristic and the variation of the measured characteristic to adjust a parameter of the process model.
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